The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2016
Filed:
Aug. 30, 2013
Applicants:
Khaled Z. Ahmed, Anaheim, CA (US);
Steven Hung, Sunnyvale, CA (US);
Kaushal K. Singh, Santa Clara, CA (US);
Sundar Ramamurthy, Fremont, CA (US);
Inventors:
Khaled Z. Ahmed, Anaheim, CA (US);
Steven Hung, Sunnyvale, CA (US);
Kaushal K. Singh, Santa Clara, CA (US);
Sundar Ramamurthy, Fremont, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/322 (2006.01); H01L 21/30 (2006.01); H01L 21/67 (2006.01); H01L 21/28 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3003 (2013.01); H01L 21/02164 (2013.01); H01L 21/02301 (2013.01); H01L 21/02315 (2013.01); H01L 21/2822 (2013.01); H01L 21/28194 (2013.01); H01L 21/28255 (2013.01); H01L 21/306 (2013.01); H01L 21/6715 (2013.01); H01L 21/67207 (2013.01); H01L 29/66545 (2013.01);
Abstract
Provided are methods and apparatus for functionalizing a substrate surface used as the channel in a gate stack. Silicon, germanium and silicon germanium substrates surfaces are functionalized with one or more of sulfur and selenium by plasma processing.