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Yokohama, Japan

Soichi Inoue

This inventor holds 116 USPTO granted patents, primarily in Semiconductor Fabrication (CPC class 430-5). Top assignees: Kabushiki Kaisha Toshiba, Nikon Corporation, Shin-Etsu Handotai Co., Ltd.. Active years: 1995-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Soichi Inoue. Retrieved from https://idiyas.com/inventor/soichi-inoue

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 116

% Patents Active = 64.7

Average Co-Inventor Count = 3.6

ph-index = 19

Forward Citations = 1,813(Granted Patents)

Forward Citations (Not Self Cited) = 1,745(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Kanagawa-ken, JP (2003 - 2012)
  • Kanagawa, JP (2005 - 2014)
  • Yokohama, JP (1995 - 2018)
  • Yokohama Kanagawa, JP (2020)

Company Filing History:

goldMedal114 out of 53,332 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal3 out of 9,008 
 
Nikon Corporation
 patents
bronzeMedal3 out of 1,099 
 
Shin-Etsu Handotai Co., Ltd.
 patents
4. 2 out of 2,955 
 
Toshiba Memory Corporation
 patents
5. 1 out of 3,208 
 
Dai Nippon Printing Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 1995-2020

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Areas of Expertise:
Pattern-Forming Method
Semiconductor Memory Device
Mask Pattern Correction
Exposure Method
Device Fabrication
Design Layout
Photomask Manufacturing
Wafer Quality Assurance
Defect Inspection
Integrated Circuit Design
Parameter Adjustment
Light Intensity Simulation
116 patents (USPTO):Explore Patents
1. 10811252 - Pattern-forming method (2020-10-20),
2. 9922991 - Semiconductor memory device and method for manufacturing same (2018-03-20),
3. 8885949 - Pattern shape determining method, pattern shape verifying method, and pattern correcting method (2014-11-11),
4. 8654313 - Exposing method and method of manufacturing semiconductor device (2014-02-18),
5. 8440376 - Exposure determining method, method of manufacturing semiconductor device, and computer program product (2013-05-14),
6. RE43659 - Method for making a design layout of a semiconductor integrated circuit (2012-09-10),
7. 8261214 - Pattern layout creation method, program product, and semiconductor device manufacturing method (2012-09-04),
8. 8183119 - Semiconductor device fabrication method using multiple mask patterns (2012-05-22),
9. 8163611 - Semiconductor device fabrication method and semiconductor device (2012-04-24),
10. 8158527 - Semiconductor device fabrication method using multiple resist patterns (2012-04-17),
11. 8142961 - Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method (2012-03-27),
12. 8121387 - Mask pattern verifying method (2012-02-21),
13. 8086973 - Pattern management method and pattern management program (2011-12-27),
14. 8046722 - Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device (2011-10-25),
15. 7966584 - Pattern-producing method for semiconductor device (2011-06-21),

Title: The Innovative Journey of Soichi Inoue

Introduction: Soichi Inoue, a pioneering inventor hailing from Yokohama, Japan, has made significant contributions to the world of innovations with his groundbreaking ideas and inventions.

Latest Patents: Soichi Inoue's latest patents showcase his continuous dedication to pushing the boundaries of technology and creativity, with a focus on improving everyday life through his inventions.

Career Highlights: Throughout his illustrious career, Soichi Inoue has been recognized for his inventive spirit and problem-solving skills, leading to the successful development of numerous patented inventions that have made a positive impact on society.

Collaborations: Soichi Inoue has collaborated with leading research institutions, universities, and innovative companies to further his inventions and bring them to the market, showcasing his ability to work effectively in multidisciplinary teams.

Conclusion: Soichi Inoue's passion for innovation, coupled with his relentless drive to create solutions for real-world problems, solidifies his position as a prominent figure in the world of inventors, inspiring future generations to pursue their inventive dreams.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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