Norio Hasegawa

USPTO Granted Patents = 108 (Patent Applications = 1)

Average Co-Inventor Count = 3.3

ph-index = 20

Forward Citations = 1,198(Granted Patents)

Inventors with similar research interests:

Location History:

Mito, JP (1994 - 1996)
Hinodemachi, both of Tokyo, JP (1996)
Shinagawa-ku, Tokyo, JP (1997)
Nishitama-gun, JP (1997)
Hinodemachi, JP (1982 - 2003)
Chiyoda-ku, Tokyo JP (2004)
Ohme, JP (2004)
Nishitama, JP (1986 - 2007)
Kodaira, JP (2011)
Hinode, JP (1989 - 2015)
Tokyo, JP (1986 - 2020)
Chiyoda-ku, JP (2020 - 2022)

Company Filing History:

Renesas Technology Corp.

patents

9 out of 2,874

Hitachi-high-technologies Corporation

patents

4. 4 out of 1,257

Hitachi-kokusai Electric Inc.

Dai Nippon Printing Co., Ltd.

Hitachi Automotive Engineering Co., Ltd.

patents

9. 1 out of 182

Hitachi Vlsi Engineering Corp.

12. 2 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 1982-2022

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108 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11391630 - Spectrum measuring device and spectrum measuring method (2022-07-19),

2. 10870828 - Cell survival rate determining device (2020-12-22),

3. 10627337 - Cell survival rate determining device and cell survival rate determining method (2020-04-21),

4. 10545018 - Pattern measurement device, and computer program for measuring pattern (2020-01-28),

5. 10445875 - Pattern-measuring apparatus and semiconductor-measuring system (2019-10-15),

6. 10302548 - Fluorescent particle measuring method (2019-05-28),

7. 9990708 - Pattern-measuring apparatus and semiconductor-measuring system (2018-06-05),

8. 9589343 - Pattern measurement device, evaluation method of polymer compounds used in self-assembly lithography, and computer program (2017-03-07),

9. 9390934 - Phase shift mask, method of forming asymmetric pattern, method of manufacturing diffraction grating, and method of manufacturing semiconductor device (2016-07-12),

10. 9297649 - Pattern dimension measurement method and charged particle beam apparatus (2016-03-29),

11. 9183622 - Image processing apparatus (2015-11-10),

12. 9024272 - Pattern measuring apparatus (2015-05-05),

13. 8671366 - Estimating shape based on comparison between actual waveform and library in lithography process (2014-03-11),

14. 8148682 - Method and apparatus for pattern position and overlay measurement (2012-04-03),

15. 8085870 - Transmitter (2011-12-27),

Title: Norio Hasegawa: Pioneering Innovator Shaping the Future of Technology

Introduction:

Norio Hasegawa, a visionary inventor from Hinode, Japan, has made significant contributions to the world of technology through his innovative spirit and commitment to excellence. With 108 patents to his name, Hasegawa's work has left a lasting impact on the field of technology and beyond.

Latest Patents:

Among Norio Hasegawa's latest patents is a spectrum measuring device and spectrum measuring method. This device includes an accommodation part for containing a culture solution with cells, a light source device for irradiating the space with excitation light, a light receiving device for capturing fluorescence, and an arithmetic device for spectral analysis. Additionally, he has developed a cell survival rate determining device that calculates the survival rate of cells based on autofluorescence peak wavelengths.

Career Highlights:

Hasegawa has had a distinguished career working with prominent companies such as Hitachi, Ltd. and Renesas Technology Corp. His innovative mindset and dedication to pushing the boundaries of technology have led to numerous breakthroughs in the field.

Collaborations:

Throughout his career, Norio Hasegawa has collaborated with talented individuals such as Toshihiko Tanaka and Katsuya Hayano. These partnerships have fueled creativity and innovation, leading to the development of groundbreaking technologies.

Conclusion:

Norio Hasegawa's passion for innovation and relentless pursuit of excellence have established him as a visionary inventor, shaping the future of technology. His work continues to inspire new generations of inventors and leaves a lasting legacy on the world of technology.

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