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For the Inventor, By the Inventor

Hinode, Japan

Norio Hasegawa

This inventor holds 108 USPTO granted patents and 1 published patent application, primarily in Semiconductor Fabrication (CPC class G03F9-00). Top assignees: Hitachi, Ltd., Renesas Technology Corp., Hitachi-High-Technologies Corporation. Active years: 1982-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norio Hasegawa. Retrieved from https://idiyas.com/inventor/norio-hasegawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 108 

% Patents Active = 76.9

Average Co-Inventor Count = 3.3

ph-index = 20

Forward Citations = 1,201(Granted Patents)

Forward Citations (Not Self Cited) = 1,164(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Mito, JP (1994 - 1996)
  • Hinodemachi, both of Tokyo, JP (1996)
  • Shinagawa-ku, Tokyo, JP (1997)
  • Nishitama-gun, JP (1997)
  • Hinodemachi, JP (1982 - 2003)
  • Chiyoda-ku, Tokyo JP (2004)
  • Ohme, JP (2004)
  • Nishitama, JP (1986 - 2007)
  • Kodaira, JP (2011)
  • Hinode, JP (1989 - 2015)
  • Tokyo, JP (1986 - 2020)
  • Chiyoda-ku, JP (2020 - 2022)

Company Filing History:

goldMedal63 out of 42,731 
 
Hitachi, Ltd.
 patents
silverMedal25 out of 3,781 
 
Renesas Technology Corp.
 patents
bronzeMedal9 out of 2,874 
 
Hitachi-High-Technologies Corporation
 patents
4. 4 out of 356 
 
Azbil Corporation
 patents
5. 4 out of 1,258 
 
Hitachi-Kokusai Electric Inc.
 patents
6. 2 out of 3,208 
 
Dai Nippon Printing Co., Ltd.
 patents
7. 1 out of 152 
 
Hitachi Automotive Engineering Co., Ltd.
 patents
8. 1 out of 1 
 
Hitachi Ltd. Et Al.
 patent
9. 1 out of 182 
 
Hitachi Vlsi Engineering Corp.
 patents
10. 2 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 1982-2022

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Areas of Expertise:
Semiconductor Fabrication
Photomask
Pattern Measurement
Integrated Circuit
Lithography
Transmitter
Cell Survival Rate
Spectrum Measurement
Charged Particle Beam
Polymer Compounds
Diffraction Grating
Waveform Comparison
108 patents (USPTO):Explore Patents
1. 11391630 - Spectrum measuring device and spectrum measuring method (2022-07-19),
2. 10870828 - Cell survival rate determining device (2020-12-22),
3. 10627337 - Cell survival rate determining device and cell survival rate determining method (2020-04-21),
4. 10545018 - Pattern measurement device, and computer program for measuring pattern (2020-01-28),
5. 10445875 - Pattern-measuring apparatus and semiconductor-measuring system (2019-10-15),
6. 10302548 - Fluorescent particle measuring method (2019-05-28),
7. 9990708 - Pattern-measuring apparatus and semiconductor-measuring system (2018-06-05),
8. 9589343 - Pattern measurement device, evaluation method of polymer compounds used in self-assembly lithography, and computer program (2017-03-07),
9. 9390934 - Phase shift mask, method of forming asymmetric pattern, method of manufacturing diffraction grating, and method of manufacturing semiconductor device (2016-07-12),
10. 9297649 - Pattern dimension measurement method and charged particle beam apparatus (2016-03-29),
11. 9183622 - Image processing apparatus (2015-11-10),
12. 9024272 - Pattern measuring apparatus (2015-05-05),
13. 8671366 - Estimating shape based on comparison between actual waveform and library in lithography process (2014-03-11),
14. 8148682 - Method and apparatus for pattern position and overlay measurement (2012-04-03),
15. 8085870 - Transmitter (2011-12-27),

Title: Norio Hasegawa: Pioneering Innovator Shaping the Future of Technology

Introduction:

Norio Hasegawa, a visionary inventor from Hinode, Japan, has made significant contributions to the world of technology through his innovative spirit and commitment to excellence. With 108 patents to his name, Hasegawa's work has left a lasting impact on the field of technology and beyond.

Latest Patents:

Among Norio Hasegawa's latest patents is a spectrum measuring device and spectrum measuring method. This device includes an accommodation part for containing a culture solution with cells, a light source device for irradiating the space with excitation light, a light receiving device for capturing fluorescence, and an arithmetic device for spectral analysis. Additionally, he has developed a cell survival rate determining device that calculates the survival rate of cells based on autofluorescence peak wavelengths.

Career Highlights:

Hasegawa has had a distinguished career working with prominent companies such as Hitachi, Ltd. and Renesas Technology Corp. His innovative mindset and dedication to pushing the boundaries of technology have led to numerous breakthroughs in the field.

Collaborations:

Throughout his career, Norio Hasegawa has collaborated with talented individuals such as Toshihiko Tanaka and Katsuya Hayano. These partnerships have fueled creativity and innovation, leading to the development of groundbreaking technologies.

Conclusion:

Norio Hasegawa's passion for innovation and relentless pursuit of excellence have established him as a visionary inventor, shaping the future of technology. His work continues to inspire new generations of inventors and leaves a lasting legacy on the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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