Santa Clara, CA, United States of America

Christophe Pierrat

USPTO Granted Patents = 182 

 

Average Co-Inventor Count = 1.5

ph-index = 36

Forward Citations = 4,937(Granted Patents)


Inventors with similar research interests:


Location History:

  • Watchung, NJ (US) (1993 - 1994)
  • Basking Ridge, NJ (US) (1994 - 1995)
  • Boise, IA (US) (1999)
  • Boise, ID (US) (1996 - 2006)
  • Hsin-Chu, TW (2001 - 2006)
  • Msin-Chu, TW (2006)
  • Santa Clara, CA (US) (2001 - 2015)

Company Filing History:


Years Active: 1993-2015

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Areas of Expertise:
Photolithography
Phase Shifting Masks
Semiconductor Patterning
Proximity Effect Correction
Mask Data Preparation
Lithography Modeling
Design-Manufacturing Interface
Critical Dimension Control
Capacitor Formation
DRAM Circuitry
Spacer Double Patterning
Optical Proximity Correction
182 patents (USPTO):Explore Patents

Title: Christophe Pierrat: A Pioneering Inventor in Phase Processing Innovations

Introduction:

In the realm of innovations and patents, Christophe Pierrat has carved a significant path with his extensive career in developing novel solutions for phase processing. With a strong presence in Santa Clara, CA, Christophe Pierrat has emerged as an exemplary inventor, contributing profoundly to the world of integrated circuits, photolithographic masks, and other cutting-edge technologies. This article delves into his latest patents, noteworthy career highlights, collaborations, and his ongoing commitment to pushing the boundaries of innovation in this field.

Latest Patents:

Christophe Pierrat's latest patents have focused on enhancing the process of handling flat data for phase processing. One of his recent patents, titled "Handling of Flat Data for Phase Processing Including Growing Shapes Within Bins to Identify Clusters," highlights a method to expedite the phase shifting process by dividing the original layout into clusters that can be processed independently. By enlarging and grouping shapes within bins, the clustering process becomes more efficient, allowing for parallel phase shifting on multiple computers.

Another notable patent, "Layout of Phase Shifting Photolithographic Masks with Refined Shifter Shapes," introduces a method to define, arrange, and refine phase shifters to effectively define layers of material in integrated circuits. This process involves generating computer-readable definitions of phase shift masks, thereby optimizing mask manufacturability and maximizing the definition of each feature.

Career Highlights:

Throughout his remarkable career, Christophe Pierrat has demonstrated a consistent commitment to pioneering advancements in the field of phase processing. His groundbreaking work has been showcased in his 182 patents, showcasing his exceptional knowledge and expertise. With a keen focus on practicality, efficiency, and performance, Pierrat has contributed significantly to the field of integrated circuits.

Collaborations:

Christophe Pierrat has collaborated with esteemed companies such as Micron Technology Incorporated and Numerical Technologies, Inc. These collaborations have allowed for the realization and implementation of his innovative ideas in real-world applications. Working alongside talented coworkers, such as Youping Zhang and Nanseng Jeng, Pierrat has been able to leverage their expertise to further refine his inventions and strengthen the impact of his work.

Conclusion:

Christophe Pierrat's contributions to the field of phase processing have been nothing short of remarkable. With an impressive collection of patents and collaborations with renowned companies, Pierrat has consistently demonstrated his passion for innovation and drive for pushing the boundaries of what is possible. His inventive solutions in handling flat data and defining phase shifting layouts have undoubtedly had a significant impact on the field of integrated circuits. As his career continues to evolve, we eagerly anticipate the next breakthroughs from this exemplary innovator.

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