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San Jose, CA, United States of America

Numerical Technologies, Inc.

USPTO Granted Patents = 77

% Expired Patents = 1.3

Trademarks = 3

Forward Citations = 4,050

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40 inventors (with patents filed for the assignee):

Christophe Pierrat (36 out of 182 patents)

Yao-Ting Wang (18 out of 33 patents)

Hua-Yu Liu (11 out of 28 patents)

4. Yagyensh C Pati (10 out of 18 patents)

5. Youping Zhang (10 out of 22 patents)

6. Fang-Cheng Chang (9 out of 24 patents)

7. Shao-Po Wu (8 out of 16 patents)

8. Seonghun Cho (5 out of 6 patents)

9. Michel Luc Côté (5 out of 5 patents)

10. Chin-Hsen Lin (3 out of 5 patents)

11. Philippe Hurat (2 out of 5 patents)

12. Yong Liu (2 out of 4 patents)

13. Linard Karklin (2 out of 11 patents)

14. Kent Richardson (2 out of 3 patents)

15. Michael Sanie (2 out of 3 patents)

Core Competencies:

Phase Shifting Masks

Optical Proximity Correction

Integrated Circuits

Layout Optimization

Defect Analysis

Mask Design

3D Effects Correction

Mask Defect Analysis

Resolution Enhancement

Fabrication Layout

Circuit Manufacture

Proximity Effects

77 patents: Sort by Forward Citations

1. 6928635 - Selectively applying resolution enhancement techniques to improve performance and manufacturing cost of integrated circuits (2005-08-09),

2. 6901575 - Resolving phase-shift conflicts in layouts using weighted links between phase shifters (2005-05-31),

3. 6887630 - Method and apparatus for fracturing polygons on masks used in an optical lithography process (2005-05-03),

4. 6870951 - Method and apparatus to facilitate auto-alignment of images for defect inspection and defect analysis (2005-03-22),

5. 6859918 - Alleviating line end shortening by extending phase shifters (2005-02-22),

6. 6852471 - Exposure control for phase shifting photolithographic masks (2005-02-08),

7. 6846617 - Facilitating optical proximity effect correction through pupil filtering (2005-01-25),

8. 6846596 - Alternating phase shift masking for multiple levels of masking resolution (2005-01-25),

9. 6830854 - System and method for correcting 3D effects in an alternating phase-shifting mask (2004-12-14),

10. 6823503 - Method and apparatus for creating a phase-shifting mask for a photolithographic process (2004-11-23),

11. 6821689 - Using second exposure to assist a PSM exposure in printing a tight space adjacent to large feature (2004-11-23),

12. 6818385 - Phase shifting circuit manufacture method and apparatus (2004-11-16),

13. 6813759 - Hybrid optical proximity correction for alternating aperture phase shifting designs (2004-11-02),

14. 6811935 - Phase shift mask layout process for patterns including intersecting line segments (2004-11-02),

15. 6808850 - Performing optical proximity correction on trim-level segments not abutting features to be printed (2004-10-26),

Company Overview

Numerical Technologies, Inc., based in San Jose, California, specializes in advanced optical lithography technologies essential for the semiconductor industry. The company focuses on developing solutions such as phase shifting masks and optical proximity correction, which enhance the precision of integrated circuit manufacturing. Their expertise extends to layout optimization, defect analysis, and mask design, addressing critical challenges in semiconductor production. By leveraging innovative techniques, Numerical Technologies plays a vital role in advancing the capabilities of modern chip fabrication.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

77 Patents

#141 in San Jose, CA

#1,113 in California

#4,788 in US

#9,777 in the World

San Jose, CA, United States of America

Numerical Technologies, Inc.

Forward Citations = 4,050

40 inventors:

Christophe Pierrat (36 out of 182 patents)

Yao-Ting Wang (18 out of 33 patents)

Hua-Yu Liu (11 out of 28 patents)

4. Yagyensh C Pati (10 out of 18 patents)

5. Youping Zhang (10 out of 22 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Numerical Technologies, Inc.. Retrieved from https://idiyas.com/company/numerical-technologies

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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