Company Filing History:
Years Active: 2003-2006
Title: Innovations of Chin-Hsen Lin
Introduction
Chin-Hsen Lin is a notable inventor based in Fremont, California, recognized for his contributions to the field of integrated circuit manufacturing. With a total of five patents to his name, Lin has developed innovative techniques that enhance the efficiency and accuracy of lithography mask layouts.
Latest Patents
One of Lin's latest patents focuses on identifying phantom images generated by side-lobes. This invention addresses the issue of unwanted phantom images that can occur when features of a mask are too close together. By creating perimeters or rings around these features, potential locations of phantom images can be automatically identified from the mask layout. The technique assigns weights to overlapping areas, allowing for the identification of critical locations that may lead to phantom images. After simulating the mask layout, these locations can be analyzed to determine if a phantom image would print.
Another significant patent by Lin involves incremental lithography mask layout design and verification. This method allows for the design and verification of mask layouts to be conducted incrementally, significantly reducing the time required to produce the final mask layout. By processing sub-layouts that contain errors separately, Lin's approach streamlines the verification process, ultimately aiding in the manufacturing of integrated circuits.
Career Highlights
Throughout his career, Chin-Hsen Lin has worked with prominent companies in the technology sector, including Numerical Technologies, Inc. and Synopsys, Inc. His experience in these organizations has contributed to his expertise in the field of integrated circuit design and manufacturing.
Collaborations
Lin has collaborated with several professionals in his field, including Yao-Ting Wang and Christophe Pierrat. These collaborations have likely enriched his work and contributed to the development of his innovative patents.
Conclusion
Chin-Hsen Lin's contributions to the field of integrated circuit manufacturing through his innovative patents demonstrate his significant impact on the industry. His work continues to influence the design and verification processes in lithography, showcasing the importance of innovation in technology.