The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2004
Filed:
Oct. 21, 2002
Christophe Pierrat, Santa Clara, CA (US);
Numerical Technologies, Inc., San Jose, CA (US);
Abstract
One embodiment of the invention provides a system that performs optical proximity correction (OPC) on selected segments on a trim mask used in fabricating an integrated circuit. Upon receiving the trim mask, the system identifies selected segments on the trim mask that do not abut any feature to be printed on the integrated circuit. Next, the system performs a number of OPC operations. The system performs a first OPC operation on the selected segments to correct the selected segments. The system also performs a second OPC operation to correct segments on the trim mask that do abut features to be printed on the integrated circuit. The system additionally performs a third OPC operation on an associated phase shifting mask to correct segments that abut features to be printed on the integrated circuit. (Note that the first, second and third OPC operations can be performed separately or at the same time.)