Company Filing History:
Years Active: 2003-2005
Title: Michael Sanie: Innovator in Integrated Circuit Design
Introduction
Michael Sanie is a prominent inventor based in Menlo Park, California. He has made significant contributions to the field of integrated circuit design, holding three patents that focus on optimizing mask costs and enhancing manufacturing techniques.
Latest Patents
One of his latest patents is titled "Mask Cost Driven Logic Optimization and Synthesis." This invention addresses the rising costs associated with mask sets due to the demand for smaller device sizes and increased chip complexity. The method described allows for the optimization of mask designs based on integrated circuit characteristics such as speed, area, and power consumption. By accessing cells from a library that includes a mask cost metric, the design can be synthesized to minimize total mask costs.
Another notable patent is "Selectively Applying Resolution Enhancement Techniques to Improve Performance and Manufacturing Cost of Integrated Circuits." This invention provides a system that applies resolution enhancement techniques selectively to an integrated circuit layout. The system identifies critical regions within the layout based on timing, dynamic power, and off-state leakage current. It then performs aggressive operations on critical regions while applying less aggressive techniques to non-critical areas, thereby optimizing the overall design.
Career Highlights
Michael Sanie has worked with notable companies in the semiconductor industry, including Numerical Technologies, Inc. and Synopsys, Inc. His experience in these organizations has contributed to his expertise in integrated circuit design and optimization.
Collaborations
Throughout his career, Michael has collaborated with talented individuals such as Dipankar Pramanik and Susan Jennifer Lippincott. These collaborations have further enriched his work and innovations in the field.
Conclusion
Michael Sanie is a distinguished inventor whose work in integrated circuit design has led to significant advancements in mask cost optimization and manufacturing techniques. His contributions continue to influence the semiconductor industry and drive innovation forward.