The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2005

Filed:

Apr. 21, 2003
Applicants:

Michael Sanie, Menlo Park, CA (US);

Dipankar Pramanik, Saratoga, CA (US);

Susan Jennifer Lippincott, Redwood City, CA (US);

Inventors:

Michael Sanie, Menlo Park, CA (US);

Dipankar Pramanik, Saratoga, CA (US);

Susan Jennifer Lippincott, Redwood City, CA (US);

Assignee:

Synopsys, Inc., Mountain View, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F017/50 ;
U.S. Cl.
CPC ...
Abstract

The cost of making a mask set cost has been dramatically increasing due to demand for very small device sizes as well as higher chip complexity. Thus, users would like to minimize the total mask costs. Current logic synthesis tools can create mask designs based on IC characteristics, e.g. speed, area, and power consumption. Therefore, a method of providing a mask design that can be optimized for cost is described. This method includes accessing cells from a library, wherein each cell includes a mask cost metric. Additionally, the weightings of one or more parameters in a constraints listing can be determined. Of importance, at least one parameter relates to mask cost. At this point, logic synthesis can be performed on the design using both the cells and the constraints listing. Advantageously, the resulting synthesized design can be optimized for mask cost.


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