Company Filing History:
Years Active: 2003-2011
Title: **Innovator Spotlight: Yong Liu**
Introduction
Yong Liu, an accomplished inventor based in Fremont, California, has made significant contributions to the field of photolithography with a total of four patents to his name. His innovative approaches continue to advance the technologies associated with mask patterns used in lithography processes, showcasing his dedication to engineering excellence and problem-solving.
Latest Patents
Among Yong Liu's most recent inventions are two groundbreaking patents focused on improving mask patterns in lithography processes. The first patent, titled "Technique for correcting hotspots in mask patterns and write patterns," describes a method where a computer system determines a second mask pattern based on a first, ensuring compliance with predetermined rules. This technique aims to enhance the quality of mask patterns by correcting regions that do not meet specified criteria.
The second patent, "Mask-patterns including intentional breaks," provides a method for determining mask patterns that consist of various distinct types of regions. This innovation allows for the effective separation of features in a mask pattern while ensuring coverage of continuous features, thereby optimizing the photolithographic process for enhanced results.
Career Highlights
Yong Liu's professional journey includes notable tenures at leading technology firms. He has worked with Numerical Technologies, Inc. and Luminescent Technologies, Inc., where he applied his expertise in photolithography and mask pattern technology. His work has not only led to advancements in the field but has also positioned him as an authority in lithography processes.
Collaborations
Throughout his career, Yong Liu has collaborated with other talented professionals, including Hua-Yu Liu and John F. McCarty. These collaborations have contributed to a rich exchange of ideas and innovations, further enhancing the efficacy of his work and the impact of his inventions.
Conclusion
Yong Liu's contributions to the field of photolithography, underscored by his innovative patents, illustrate the importance of creativity and scientific inquiry in engineering. As technology continues to evolve, inventors like Liu play a crucial role in shaping the future of manufacturing processes, making significant strides in quality, efficiency, and functionality.