The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Oct. 04, 2006
Daniel S. Abrams, Mountain View, CA (US);
Danping Peng, Fremont, CA (US);
Yong Liu, Fremont, CA (US);
Paul Rissman, Palo Alto, CA (US);
Daniel S. Abrams, Mountain View, CA (US);
Danping Peng, Fremont, CA (US);
Yong Liu, Fremont, CA (US);
Paul Rissman, Palo Alto, CA (US);
Luminescent Technologies, Inc., Palo Alto, CA (US);
Abstract
A method for determining a mask pattern to be used on a photo-mask in a photolithographic process is described. During the method, a target pattern that includes at least one continuous feature is provided. Then a mask pattern that includes a plurality of distinct types of regions corresponding to the distinct types of regions of the photo-mask is determined. Note that the mask pattern includes at least two separate features corresponding to at least the one continuous feature. Furthermore, at least the two separate features are separated by a spacing having a length and the spacing overlaps at least a portion of at least the one continuous feature.