Company Filing History:
3 out of 3,715 
2 out of 35 
1 out of 27,412 
Years Active: 1984-2011
Title: The Innovative Contributions of Paul Rissman
Introduction
Paul Rissman is a notable inventor based in Palo Alto, California, recognized for his significant contributions to the field of photolithography. With a total of eight patents to his name, Rissman has developed innovative methods that enhance the efficiency and effectiveness of photolithographic processes. His work has had a profound impact on the semiconductor industry and related technologies.
Latest Patents
Among Rissman's latest patents is a method for determining mask patterns for use in multiple-exposure lithography. This patent describes a process that utilizes an initial mask pattern intended for single-exposure photolithography alongside a target pattern to derive first and second mask patterns for multiple-exposure processes. The first mask pattern includes a first feature, while the second mask pattern contains a second feature that overlaps with the intersection of features in the initial mask pattern. Additionally, both mask patterns exhibit decreased spatial frequency relative to the initial mask pattern in at least one direction.
Another significant patent involves mask patterns that include intentional breaks. This method outlines the determination of a mask pattern for a photo-mask in a photolithographic process. It begins with a target pattern featuring at least one continuous feature, leading to the creation of a mask pattern with distinct regions corresponding to the photo-mask. The mask pattern comprises at least two separate features that correspond to the continuous feature, with a spacing that overlaps a portion of the continuous feature.
Career Highlights
Rissman has worked with prominent companies such as LSI Logic Corporation and Luminescent Technologies, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in photolithography.
Collaborations
Throughout his career, Rissman has collaborated with notable individuals, including Richard D. Schinella and Sheldon Aronowitz. These collaborations have fostered an environment of innovation and creativity, leading to the development of advanced technologies in the field.
Conclusion
Paul Rissman's contributions to photolithography through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing and related technologies.