Location History:
- Mountain View, CA (US) (2008 - 2011)
- Palo Alto, CA (US) (2006 - 2014)
Company Filing History:
24 out of 35 
1 out of 832,843 Years Active: 2006-2014
Title: The Innovative Contributions of Daniel S Abrams
Introduction
Daniel S Abrams is a prominent inventor based in Palo Alto, California, known for his significant contributions to the field of technology through his numerous patented innovations. With a remarkable portfolio of 25 patents, Abrams has made substantial advancements, particularly in the realm of photo-mask and wafer image reconstruction.
Latest Patents
Among his latest patents, one notable invention is the photo-mask and wafer image reconstruction system. This innovative system is designed to receive a mask pattern and a first image of a portion of a photo-mask corresponding to that mask pattern. The ingenuity of the system lies in its ability to determine a second image of that portion of the photo-mask, characterized by additional spatial frequencies compared to the first image. This advancement plays a critical role in enhancing imaging techniques, which is essential in various high-tech applications.
Career Highlights
Daniel S Abrams has had a successful career marked by his involvement with significant companies such as Luminescent Technologies, Inc. Throughout his tenure, he has been instrumental in pushing the boundaries of technological innovation, contributing to various projects and research initiatives that advance the fields of imaging and manufacturing.
Collaborations
Throughout his career, Abrams has collaborated with talented professionals, including colleagues Danping Peng and Stanley Joel Osher. These partnerships have not only enriched his work experience but also bolstered the innovative outputs of the teams he has been part of, fostering a culture of creativity and technological advancement.
Conclusion
As an inventor, Daniel S Abrams exemplifies the spirit of innovation through his extensive patent portfolio and collaborative efforts in the technology sector. His work in photo-mask and wafer image reconstruction highlights his commitment to advancing the field, paving the way for future developments in imaging and semiconductor manufacturing.