The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2011
Filed:
Apr. 14, 2009
Yong Liu, Fremont, CA (US);
John F. Mccarty, Redwood City, CA (US);
Kelly Gordon Russell, Santa Clara, CA (US);
Linyong Pang, Palo Alto, CA (US);
Yong Liu, Fremont, CA (US);
John F. McCarty, Redwood City, CA (US);
Kelly Gordon Russell, Santa Clara, CA (US);
Linyong Pang, Palo Alto, CA (US);
Luminescent Technologies, Inc., Palo Alto, CA (US);
Abstract
Embodiments of a method for determining a mask pattern to be used on a photo-mask in a lithography process are described. This method may be performed by a computer system. During operation, this computer system receives at least a portion of a first mask pattern including first regions that violate pre-determined rules associated with the photo-mask. Next, the computer system determines a second mask pattern based on at least the portion of the first mask pattern, where the second mask pattern includes second regions that are estimated to comply with the pre-determined rules. Note that the second regions correspond to the first regions, and the second mask pattern is determined using a different technique than that used to determine the first mask pattern.