Company Filing History:
Years Active: 2011-2013
Title: John F McCarty: Innovator in Photolithography
Introduction
John F McCarty is a notable inventor based in Redwood City, CA (US). He has made significant contributions to the field of photolithography, holding 2 patents that showcase his innovative techniques.
Latest Patents
One of his latest patents is focused on the Full-field Mask Error Enhancement Function. This technique involves determining a full-field Mask Error Enhancement Function (MEEF) associated with a mask pattern for use in a photolithographic process. The process includes generating simulated wafer patterns corresponding to the mask pattern at an image plane in an optical path. The full-field MEEF is then determined, which includes MEEF values in multiple directions at positions along contours that define boundaries of features in the simulated wafer patterns. Notably, at least one of the MEEF values is positioned on a contour where a critical dimension for a feature is undefined.
Another significant patent involves a technique for correcting hotspots in mask patterns and write patterns. This method is performed by a computer system that receives a portion of a first mask pattern, which includes regions that violate predetermined rules. The system then determines a second mask pattern that complies with these rules, ensuring that the second regions correspond to the first regions but are derived using a different technique.
Career Highlights
Throughout his career, John F McCarty has worked with prominent companies such as Luminescent Technologies, Inc. and Synopsys, Inc. His work in these organizations has contributed to advancements in photolithography and related technologies.
Collaborations
John has collaborated with notable individuals in his field, including Linyong Pang and Yong Liu. These collaborations have further enriched his contributions to the industry.
Conclusion
John F McCarty is a distinguished inventor whose work in photolithography has led to innovative techniques that enhance the efficiency and accuracy of lithographic processes. His patents reflect a deep understanding of the complexities involved in mask patterns and their applications.