Company Filing History:
Years Active: 2003-2010
Title: Linard Karklin - Innovator in Mask Defect Printability Analysis
Introduction
Linard Karklin is a prominent inventor based in Sunnyvale, California, known for his significant contributions to the field of semiconductor manufacturing. He holds a total of 11 patents, showcasing his expertise and innovative spirit in developing advanced technologies.
Latest Patents
One of his latest patents is a system and method of providing mask defect printability analysis. This invention utilizes a simulated wafer image of a physical mask alongside a defect-free reference image to generate a severity score for each defect. This process provides customers with meaningful information to accurately assess the consequences of using or repairing a mask. The defect severity score is calculated based on various factors related to changes in critical dimensions of neighboring features to the defect. Additionally, a common process window can be employed to offer objective information regarding defect printability. Other aspects of mask quality, such as line edge roughness and contact corner rounding, can also be quantified using the simulated wafer image of the physical mask.
Career Highlights
Throughout his career, Linard Karklin has worked with notable companies in the semiconductor industry, including Synopsys, Inc. and Numerical Technologies, Inc. His work has significantly impacted the development of technologies that enhance the efficiency and accuracy of semiconductor manufacturing processes.
Collaborations
Linard has collaborated with talented professionals in his field, including Linyong