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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9024272 B1

PDFFull Text
Date of Patent:
May. 05, 2015

Filed:

Dec. 01, 2010

Pattern measuring apparatus

Applicants:

Kei Sakai, Hitachinaka, JP;

Yafeng Zhang, Hitachinaka, JP;

Norio Hasegawa, Tokyo, JP;

Inventors:

Kei Sakai, Hitachinaka, JP;

Yafeng Zhang, Hitachinaka, JP;

Norio Hasegawa, Tokyo, JP;

Assignee:

Hitachi High-Technologies Corporation, Tokyo, JP;

Attorney:

Crowell & Moring LLP

Primary Examiner:

Bernard E Souw

Int. Cl.
CPC ...
G21K 1/08 (2006.01); H01J 3/14 (2006.01); H01J 3/26 (2006.01); H01J 49/42 (2006.01); G03F 7/20 (2006.01); G06T 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70466 (2013.01); G01B 2210/56 (2013.01); H01J 2237/2817 (2013.01); G06T 7/001 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A pattern measuring apparatus which can identify a kind of gaps formed by a manufacturing process having a plurality of exposing steps such as SADP, particularly, which can suitably access a gap even if a sample has the gap that is not easily accessed is disclosed. A feature amount regarding one end side of a pattern having a plurality of patterns arranged therein and a plurality of kinds of feature amounts regarding the other end side of the pattern are extracted from a signal detected on the basis of scanning of a charged particle beam. With respect to proper kinds of feature amounts among the plurality of kinds of feature amounts, the feature amount on one side of the pattern and that on the other end side of the pattern are compared. On the basis of the comparison, the kinds of spaces among the patterns are determined.

Find Patent Forward Citations

Sakai, Kei. (2015). Pattern measuring apparatus (U.S. Patent No. 9024272). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9024272

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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