The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2013
Filed:
Jan. 14, 2011
Toshiya Kotani, Tokyo, JP;
Kazuya Fukuhara, Tokyo, JP;
Michiya Takimoto, Kanagawa, JP;
Hidefumi Mukai, Mie, JP;
Soichi Inoue, Kanagawa, JP;
Toshiya Kotani, Tokyo, JP;
Kazuya Fukuhara, Tokyo, JP;
Michiya Takimoto, Kanagawa, JP;
Hidefumi Mukai, Mie, JP;
Soichi Inoue, Kanagawa, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to one embodiment, a deviation amount distribution of a two-dimensional shape parameter between a mask pattern formed on a mask and a desired mask pattern is acquired as a mask pattern map. Such that a deviation amount of the two-dimensional shape parameter between a pattern on substrate formed when the mask is subjected to exposure shot to form a pattern on a substrate and a desired pattern on substrate fits within a predetermined range, an exposure is determined for each position in the exposure shot in forming the pattern on substrate based on the mask pattern map.