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Kazuya Fukuhara

USPTO Granted Patents = 66 (Patent Applications = 19)

Average Co-Inventor Count = 2.2

ph-index = 6

Forward Citations = 151(Granted Patents)

Forward Citations (Not Self Cited) = 145(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Kanagawa, JP (2013 - 2015)
Suginami, JP (2017)
Suginami-ku, JP (2018)
Tokyo, JP (2005 - 2023)
Suginami Tokyo, JP (2018 - 2024)
Yokkaichi Mie, JP (2024)

Company Filing History:

46 out of 52,766

Kabushiki Kaisha Toshiba

Kioxia Corporation

Renesas Electronics Corporation

4. 5 out of 2,955

Toshiba Memory Corporation

5. 1 out of 3,781

Renesas Technology Corp.

6. 1 out of 15,942

Mitsubishi Electric Corporation

Years Active: 2005-2025

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Areas of Expertise:

Semiconductor Devices

Imprint Apparatus

Photomask Manufacturing

Pattern Formation

Exposure Methods

Template Manufacturing

Power Semiconductor Devices

Mask Data Correction

Nano-Imprint Technology

Pattern Accuracy Detection

Projection Exposure

Immersion Exposure

66 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12386254 - Template, method for manufacturing template, and method for manufacturing semiconductor device (2025-08-12),

2. 12232300 - Power semiconductor device and method for manufacturing power semiconductor device (2025-02-18),

3. 12078925 - Imprint apparatus and imprint method (2024-09-03),

4. 12050401 - Imprinting device, imprinting method, and method for manufacturing semiconductor device (2024-07-30),

5. 11899360 - Imprinting method and imprinting apparatus (2024-02-13),

6. 11837469 - Imprint apparatus, imprint method, and method of manufacturing semiconductor device (2023-12-05),

7. 11762285 - Template, patterning method, and method for manufacturing semiconductor device (2023-09-19),

8. 11669011 - Template, template manufacturing method, and semiconductor device manufacturing method (2023-06-06),

9. 11333970 - Imprint device, imprint method and method of manufacturing semiconductor device (2022-05-17),

10. 11004683 - Imprint apparatus, imprint method, and method of manufacturing semiconductor device (2021-05-11),

11. 10022748 - Stencil mask, stencil mask manufacturing method, and imprinting method (2018-07-17),

12. 9941177 - Pattern accuracy detecting apparatus and processing system (2018-04-10),

13. 9885960 - Pattern shape adjustment method, pattern shape adjustment system, exposure apparatus, and recording medium (2018-02-06),

14. 9817318 - Mask manufacturing equipment and mask manufacturing method (2017-11-14),

15. 9541847 - Imprint method and imprint system (2017-01-10),

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