The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2023
Filed:
Sep. 02, 2020
Kioxia Corporation, Tokyo, JP;
Anupam Mitra, Yokohama Kanagawa, JP;
Masaki Mitsuyasu, Kamakura Kanagawa, JP;
Kazuya Fukuhara, Suginami Tokyo, JP;
Kazuhiro Takahata, Yokohama Kanagawa, JP;
Sachiko Kobayashi, Ota Tokyo, JP;
Kioxia Corporation, Tokyo, JP;
Abstract
According to one embodiment, an imprint lithography template comprises a substrate transparent to ultraviolet light. A first mesa region is on the substrate. A surface of the first mesa region includes a pattern region to be pressed into a photocurable resist film. The pattern region having four sides. A second mesa region is also on the substrate. The first mesa region protrudes from a surface of the second mesa region. A blocking film is adjacent to two sides of the four sides pattern region. The two sides to which the blocking film is adjacent are connected to each other at a corner of the pattern region. The blocking film blocks ultraviolet light.