Anupam Mitra

Title: Anupam Mitra: Innovator in Imprint Lithography

Introduction

Anupam Mitra is a prominent inventor based in Yokohama, Kanagawa, Japan. He has made significant contributions to the field of imprint lithography, holding a total of 7 patents. His innovative work focuses on methods and apparatuses that enhance the efficiency and precision of semiconductor manufacturing.

Latest Patents

Mitra's latest patents include an imprint method, imprint apparatus, and film formation apparatus. The imprint method involves supplying a first photocurable resist to a specific region of an object, followed by the irradiation of the first resist with light. This process is crucial for forming a second resist over the object and bringing a template into contact with it. The method further includes irradiating the second resist with light through the template while maintaining contact. Another notable patent describes an imprint lithography template that comprises a substrate transparent to ultraviolet light. This template features a first mesa region with a pattern region designed to be pressed into a photocurable resist film, enhancing the precision of the imprinting process.

Career Highlights

Anupam Mitra has worked with notable companies such as Toshiba Memory Corporation and Kioxia Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in the semiconductor industry.

Collaborations

Mitra has collaborated with esteemed colleagues, including Kazuhiro Takahata and Kazuya Fukuhara. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Anupam Mitra's contributions to imprint lithography and semiconductor manufacturing are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology in this critical field.