The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2023
Filed:
Sep. 03, 2021
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventors:
Takeshi Higuchi, Yokohama Kanagawa, JP;
Anupam Mitra, Yokohama Kanagawa, JP;
Takahiro Iwasaki, Yokohama Kanagawa, JP;
Assignee:
KIOXIA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/00 (2006.01); G03F 7/16 (2006.01); G03F 7/09 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7042 (2013.01); G03F 7/0042 (2013.01); G03F 7/0382 (2013.01); G03F 7/094 (2013.01); G03F 7/161 (2013.01); G03F 7/162 (2013.01); G03F 7/2018 (2013.01); G03F 7/70208 (2013.01);
Abstract
An imprint method includes supplying a first photocurable resist to a first region of an object; irradiating the first resist with first light; forming a second resist over the object; bringing a template into contact with the second resist; and irradiating at least the second resist with second light through the template while the template is in contact with the second resist.