The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2020
Filed:
Sep. 13, 2019
Applicant:
Toshiba Memory Corporation, Tokyo, JP;
Inventors:
Anupam Mitra, Yokohama Kanagawa, JP;
Tetsuro Nakasugi, Yokohama Kanagawa, JP;
Kazuhiro Takahata, Yokohama Kanagawa, JP;
Assignee:
TOSHIBA MEMORY CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/027 (2006.01); H01L 21/311 (2006.01); G03F 7/00 (2006.01); H01L 27/11529 (2017.01); H01L 27/11573 (2017.01);
U.S. Cl.
CPC ...
H01L 21/76817 (2013.01); G03F 7/0002 (2013.01); H01L 21/0271 (2013.01); H01L 21/0274 (2013.01); H01L 21/31144 (2013.01); H01L 21/76816 (2013.01); H01L 21/76877 (2013.01); H01L 27/11529 (2013.01); H01L 27/11573 (2013.01);
Abstract
A pattern forming method includes forming a first resist pattern on a substrate using imprint lithography. And forming a resist onto the substrate at least at positions corresponding to a second resist pattern and then curing the resist to form the second resist pattern on the substrate.