The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2019

Filed:

Sep. 01, 2017
Applicant:

Toshiba Memory Corporation, Tokyo, JP;

Inventors:

Anupam Mitra, Yokohama Kanagawa, JP;

Motofumi Komori, Yokohama Kanagawa, JP;

Kazuhiro Takahata, Yokohama Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/50 (2012.01); G03F 7/00 (2006.01); B29C 33/38 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/38 (2013.01); G03F 1/50 (2013.01); G03F 7/00 (2013.01); H01L 21/31144 (2013.01); H01L 21/31116 (2013.01);
Abstract

A template for patterning processes has a first protrusion portion on a first surface with a first step portion in a first region and a second step portion in a second region. The first step portion includes a plurality of first steps, at least one of which has a first step height and a first step width. The second step portion includes a plurality of second steps, at least one of which has the first step height and the first step width. The template includes a first recess portion on the first surface between the first and second regions on the first protrusion portion. The first recess portion has at least one of a recess depth different from the first step height and a recess width different from the first step width.


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