The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
Jul. 08, 2015
Applicant:
Toshiba Memory Corporation, Tokyo, JP;
Inventors:
Masato Suzuki, Kanagawa, JP;
Akiko Mimotogi, Kanagawa, JP;
Yohko Komatsu, Kanagawa, JP;
Ryoichi Suzuki, Kanagawa, JP;
Kazuya Fukuhara, Tokyo, JP;
Assignee:
Toshiba Memory Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/12 (2006.01); G03F 1/42 (2012.01); G03F 1/50 (2012.01); G03F 1/68 (2012.01); G03F 1/20 (2012.01);
U.S. Cl.
CPC ...
B05D 3/12 (2013.01); G03F 1/42 (2013.01); G03F 1/50 (2013.01); G03F 1/68 (2013.01); G03F 1/20 (2013.01);
Abstract
According to one embodiment, a stencil mask includes a first opening and a second opening, the first opening is provided corresponding to a mark region in a template, the second opening is provided adjacent to the first opening, and the diameter of a circle circumscribing the second opening is smaller than the diameter of a circle circumscribing the first opening.
Suzuki, Masato. (2018). Stencil mask, stencil mask manufacturing method, and imprinting method (U.S. Patent No. 10022748). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10022748
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile