The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 10, 2018

Filed:

Aug. 31, 2016
Applicant:

Toshiba Memory Corporation, Tokyo, JP;

Inventors:

Kentaro Kasa, Yokkaichi Mie, JP;

Kazuya Fukuhara, Suginami Tokyo, JP;

Kazutaka Ishigo, Yokkaichi Mie, JP;

Manabu Takakuwa, Tsu Mie, JP;

Yoshinori Hagio, Kuwana Mie, JP;

Kazuhiro Segawa, Kuwana Mie, JP;

Yuki Murasaka, Yokkaichi Mie, JP;

Tetsuya Kugimiya, Kawasaki Kanagawa, JP;

Yuu Yamayose, Shinjuku Tokyo, JP;

Yosuke Okamoto, Sagamihara Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/66 (2006.01); G01B 11/27 (2006.01); G01B 11/30 (2006.01); G01N 25/72 (2006.01); H01L 21/67 (2006.01); H01L 21/027 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); G01B 11/27 (2013.01); G01B 11/306 (2013.01); G01N 25/72 (2013.01); G03F 7/039 (2013.01); G03F 7/20 (2013.01); G03F 7/26 (2013.01); H01L 21/0274 (2013.01); H01L 21/67248 (2013.01); H01L 21/67288 (2013.01); G01B 2210/56 (2013.01);
Abstract

A pattern accuracy detecting apparatus includes a stage for supporting a substrate, an optical warpage detecting unit that measures a shape of a substrate disposed on the stage, an optical pattern detection unit that detects a position of a pattern on the substrate, and a processing unit that corrects the detected pattern position based on the measured shape of the substrate.


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