Yoshinori Hagio

Title: Innovations of Yoshinori Hagio

Introduction

Yoshinori Hagio is a notable inventor based in Mie-ken, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on enhancing the accuracy and efficiency of pattern detection and alignment in semiconductor devices.

Latest Patents

One of his latest patents is the "Pattern accuracy detecting apparatus and processing system." This apparatus includes a stage for supporting a substrate, an optical warpage detecting unit that measures the shape of the substrate, an optical pattern detection unit that detects the position of a pattern on the substrate, and a processing unit that corrects the detected pattern position based on the measured shape of the substrate. Another significant patent is the "Alignment mark formation method and semiconductor device." In this invention, a first pattern is formed on an insulating film, followed by the formation of a first transparent film on the region of the insulating film that includes the first pattern. An opaque film is then formed on the entire surface of the insulating film, and a second transparent film is generated by selectively oxidizing part of the opaque film in contact with the first transparent film.

Career Highlights

Yoshinori Hagio has worked with prominent companies in the technology sector, including Kabushiki Kaisha Toshiba and Toshiba Memory Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

He has collaborated with talented individuals such as Yosuke Okamoto and Kentaro Kasa, contributing to advancements in their respective fields.

Conclusion

Yoshinori Hagio's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.