Location History:
- Yokohama, JP (2011)
- Mie, JP (2011 - 2016)
- Yokkaichi Mie, JP (2018)
Company Filing History:
Years Active: 2011-2018
Title: Kazutaka Ishigo: Innovator in Pattern Detection Technology
Introduction
Kazutaka Ishigo is a prominent inventor based in Mie, Japan. He has made significant contributions to the field of optical measurement systems, holding a total of 9 patents. His work focuses on enhancing the accuracy of pattern detection and alignment measurement, which are crucial in various technological applications.
Latest Patents
One of Ishigo's latest patents is the "Pattern accuracy detecting apparatus and processing system." This innovative apparatus includes a stage for supporting a substrate, an optical warpage detecting unit that measures the shape of the substrate, an optical pattern detection unit that detects the position of a pattern on the substrate, and a processing unit that corrects the detected pattern position based on the measured shape of the substrate. Another notable patent is the "Overlay/alignment measurement method and overlay/alignment measurement apparatus." This method involves preliminarily measuring the amount of overlay or alignment shift of the mark for overlay or alignment measurement while sequentially shifting the position of a measurement area relative to the mark. It calculates a tool-induced shift regarding the characteristic deviation of the optical measurement system for each of the plurality of partial areas.
Career Highlights
Kazutaka Ishigo has worked with notable companies such as Kabushiki Kaisha Toshiba and Toshiba Memory Corporation. His experience in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in the field.
Collaborations
Ishigo has collaborated with talented individuals in his field, including Kazuya Fukuhara and Yosuke Okamoto. These collaborations have further enhanced his work and led to the development of cutting-edge technologies.
Conclusion
Kazutaka Ishigo's contributions to pattern detection technology and optical measurement systems have made a significant impact in his field. His innovative patents and collaborations reflect his dedication to advancing technology and improving accuracy in measurements.
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