The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Nov. 23, 2010
Masanori Takahashi, Kanagawa, JP;
Takashi Sato, Kanagawa, JP;
Satoshi Tanaka, Kanagawa, JP;
Soichi Inoue, Kanagawa, JP;
Takamasa Takaki, Kanagawa, JP;
Masanori Takahashi, Kanagawa, JP;
Takashi Sato, Kanagawa, JP;
Satoshi Tanaka, Kanagawa, JP;
Soichi Inoue, Kanagawa, JP;
Takamasa Takaki, Kanagawa, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to one embodiment, on a substrate, a resist layer is laminated on an upper side of a pattern formation layer on which a desired pattern is formed. A diffraction pattern that diffracts exposure light irradiated on the substrate is formed further on the upper side than the resist layer. Overall exposure is performed from above the diffraction pattern using a deformed light having illumination light source shape determined according to the desired pattern. Diffracted light diffracted on the diffraction pattern by the exposure is irradiated on the resist layer.