The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
Mar. 20, 2008
Applicants:
Mitsuyo Asano, Yokohama, JP;
Shinji Yamaguchi, Tokyo, JP;
Satoshi Tanaka, Kawasaki, JP;
Soichi Inoue, Yokohama, JP;
Masamitsu Itoh, Yokohama, JP;
Osamu Ikenaga, Yokohama, JP;
Inventors:
Mitsuyo Asano, Yokohama, JP;
Shinji Yamaguchi, Tokyo, JP;
Satoshi Tanaka, Kawasaki, JP;
Soichi Inoue, Yokohama, JP;
Masamitsu Itoh, Yokohama, JP;
Osamu Ikenaga, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G06Q 10/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A mask pattern verifying method include obtaining first information about a hot spot from design data of a mask pattern, obtaining second information about the mask pattern actually formed on a photo mask, and determining a measuring spot of the mask pattern actually formed on the photo mask, based on the first and second information.