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For the Inventor, By the Inventor

Kurashiki, Japan

Shinya Kato

This inventor holds 14 USPTO granted patents and 1 published patent application and 8 EPO patents. Top assignees: Kuraray Co., Ltd., Maruishi Sangyo Co. Ltd.. Active years: 1998-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinya Kato. Retrieved from https://idiyas.com/inventor/shinya-kato-xvj3lcce

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 14 

% Patents Active = 92.9

 

Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 22(Granted Patents)


Location History:

  • Okayama, JP (2017)
  • Kurashiki, JP (1998 - 2020)
  • Chiyoda-ku, JP (2021 - 2023)

Company Filing History:

goldMedal14 out of 1,872 
 
Kuraray Co., Ltd.
 patents
silverMedal1 out of 3 
 
Maruishi Sangyo Co. Ltd.
 patents
where one patent can have more than one assignee

Years Active: 1998-2025

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14 patents (USPTO):Explore Patents
1. 12344702 - Polyurethane for polishing layer, polishing layer, and polishing pad (2025-07-01),
2. 12109665 - Modification method of polyurethane, polyurethane, polishing pad, and modification method of polishing pad (2024-10-08),
3. 11787894 - Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method (2023-10-17),
4. 11154960 - Polishing pad and polishing method using same (2021-10-26),
5. 11053339 - Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method (2021-07-06),
6. 10625391 - Non-porous molded article for polishing layer, polishing pad, and polishing method (2020-04-21),
7. 10328548 - Polishing-layer molded body, and polishing pad (2019-06-25),
8. 9536752 - Slurry for chemical mechanical polishing and polishing method for substrate using same (2017-01-03),
9. 9437446 - Slurry for chemical mechanical polishing and chemical mechanical polishing method (2016-09-06),
10. 9321142 - Polymer material, foam obtained from same, and polishing pad using those (2016-04-26),
11. 8430719 - Polishing pad (2013-04-30),
12. 8308527 - Metal film polishing pad and method for polishing metal film using the same (2012-11-13),
13. 8211543 - Cushion for polishing pad and polishing pad using the cushion (2012-07-03),
14. 5821180 - Laminate comprising a polyurethane layer (1998-10-13),

Title: Innovations of Shinya Kato in Polyurethane Technology

Introduction

Shinya Kato is a prominent inventor based in Kurashiki, Japan, known for his significant contributions to the field of polyurethane technology. With a total of 14 patents to his name, Kato has made remarkable advancements that have impacted various industries.

Latest Patents

Among his latest patents are innovations related to polyurethane for polishing layers, polishing layers, and polishing pads. One of his notable inventions involves a polyurethane that serves as a material for polishing pads. This polyurethane includes a thermoplastic polyurethane, which is a reaction product of a polyurethane raw material that consists of a polymer diol, an organic diisocyanate, and a chain extender. The chain extender is characterized by containing 50 mass % or more of a first chain extender with a straight-chain carbon backbone comprising 7 to 12 carbon atoms. Additionally, Kato has developed modification methods for polyurethane, which include preparing a polyurethane with an ethylenically unsaturated bond and treating it with a liquid containing a compound with a conjugated double bond.

Career Highlights

Shinya Kato has worked with notable companies such as Kuraray Co., Ltd. and Maruishi Sangyo Co. Ltd. His work in these organizations has allowed him to refine his expertise in polyurethane applications and innovations.

Collaborations

Kato has collaborated with several professionals in his field, including Mitsuru Kato and Chihiro Okamoto. These collaborations have contributed to the development of his innovative patents and have fostered a collaborative environment for research and development.

Conclusion

Shinya Kato's contributions to polyurethane technology through his patents and collaborations highlight his role as a leading inventor in this field. His work continues to influence advancements in materials used for polishing applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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