The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2012

Filed:

Mar. 19, 2008
Applicants:

Mitsuru Kato, Kurashiki, JP;

Hirofumi Kikuchi, Kurashiki, JP;

Shinya Kato, Kurashiki, JP;

Inventors:

Mitsuru Kato, Kurashiki, JP;

Hirofumi Kikuchi, Kurashiki, JP;

Shinya Kato, Kurashiki, JP;

Assignee:

Kuraray Co., Ltd., Kurashiki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 11/00 (2006.01); B32B 25/08 (2006.01); B32B 25/16 (2006.01); B32B 25/20 (2006.01); B32B 27/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a cushion for a polishing pad, wherein, when a dynamic compression viscoelasticity measurement is performed under conditions of 23° C., a static load of 27.6 kPa, a frequency of 11 Hz and an amplitude of 1 μm, (1) a phase difference between dynamic stress and deformation is 4° or less, and (2) a ratio of the maximum value of the deformation amount to the maximum value of the dynamic stress ([maximum value of deformation amount]/[maximum value of dynamic stress]) is 0.5 μm/kPa or more. The invention also provides a polishing pad having a layer of the cushion for a polishing pad and a polishing layer.


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