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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11154960 B1

PDFFull Text
Date of Patent:
Oct. 26, 2021

Filed:

Jul. 26, 2017

Polishing pad and polishing method using same

Applicant:

Kuraray Co., Ltd., Kurashiki, JP;

Inventors:

Minori Takegoshi, Kurashiki, JP;

Mitsuru Kato, Kurashiki, JP;

Chihiro Okamoto, Kurashiki, JP;

Shinya Kato, Chiyoda-ku, JP;

Assignee:

KURARAY CO., LTD., Kurashiki, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Jiong-Ping Lu

Int. Cl.
CPC ...
B24B 37/24 (2012.01); H01L 21/304 (2006.01); H01L 21/306 (2006.01); B24B 37/20 (2012.01); B24D 3/00 (2006.01); B24B 37/04 (2012.01); H01L 21/3105 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
B24B 37/24 (2013.01); B24B 37/044 (2013.01); B24B 37/20 (2013.01); B24D 3/00 (2013.01); H01L 21/304 (2013.01); H01L 21/30625 (2013.01); H01L 21/31053 (2013.01); H01L 21/3212 (2013.01);
Abstract

Provided is a polishing pad including a polishing surface having a zeta potential of +0.1 mV or more at a pH of 10.0. Preferably, a polishing pad including a polyurethane having a tertiary amine is provided. Further preferably, the polyurethane having a tertiary amine is a reaction product of a polyurethane reaction raw material containing at least a chain extender having a tertiary amine. A polishing method using the polishing pads is also provided, wherein the method is performed while supplying an alkaline polishing slurry.

Find Patent Forward Citations

Takegoshi, Minori. (2021). Polishing pad and polishing method using same (U.S. Patent No. 11154960). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11154960

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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