The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Sep. 21, 2006
Chihiro Okamoto, Kurashiki, JP;
Shinya Kato, Kurashiki, JP;
Shunji Kaneda, Kurashiki, JP;
Hirofumi Kikuchi, Kurashiki, JP;
Chihiro Okamoto, Kurashiki, JP;
Shinya Kato, Kurashiki, JP;
Shunji Kaneda, Kurashiki, JP;
Hirofumi Kikuchi, Kurashiki, JP;
KURARAY CO., LTD., Kurashiki-shi, JP;
Abstract
The subject is to provide a polymer material which enables to improve planarity and planarization efficiency of a polished surface and is useful as a polishing pad which generates only a few scratches. The said subject is solved by a polymer material having a tensile modulus at 50° C. after saturation swelling with 50° C. water of 130 to 800 MPa, a loss tangent at 50° C. of not more than 0.2, and a contact angle with water of not more than 80°.