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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11053339 B1

PDFFull Text
Date of Patent:
Jul. 06, 2021

Filed:

Apr. 27, 2018

Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method

Applicant:

Kuraray Co., Ltd., Kurashiki, JP;

Inventors:

Azusa Oshita, Kurashiki, JP;

Minori Takegoshi, Kurashiki, JP;

Mitsuru Kato, Kurashiki, JP;

Chihiro Okamoto, Kurashiki, JP;

Shinya Kato, Chiyoda-ku, JP;

Assignee:

KURARAY CO., LTD., Kurashiki, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

John M Cooney

Int. Cl.
CPC ...
C08G 18/38 (2006.01); B24B 37/24 (2012.01); C08G 18/32 (2006.01); C08G 18/76 (2006.01); H01L 21/3105 (2006.01); H01L 21/321 (2006.01); C08G 18/08 (2006.01); B24D 3/00 (2006.01); B24D 3/34 (2006.01);
U.S. Cl.
CPC ...
C08G 18/3819 (2013.01); B24B 37/24 (2013.01); B24D 3/00 (2013.01); B24D 3/002 (2013.01); B24D 3/346 (2013.01); C08G 18/0895 (2013.01); C08G 18/3206 (2013.01); C08G 18/7671 (2013.01); H01L 21/31053 (2013.01); H01L 21/3212 (2013.01);
Abstract

Disclosed herein are polyurethanes useful for polishing layers, where the polyurethane is a polyurethane having a Schiff base. Also disclosed herein are polishing layers containing the polyurethanes, polishing methods that use the polishing layers, and a modification method including a step of converting the Schiff base into at least one functional group selected from an aldehyde group, a carboxylic acid group, a hydroxyl group, and an amino group.

Find Patent Forward Citations

Oshita, Azusa. (2021). Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method (U.S. Patent No. 11053339). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11053339

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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