The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2016

Filed:

May. 27, 2013
Applicant:

Kuraray Co., Ltd., Kurashiki-shi, JP;

Inventors:

Mitsuru Kato, Kurashiki, JP;

Chihiro Okamoto, Kurashiki, JP;

Shinya Kato, Kurashiki, JP;

Assignee:

KURARAY CO., LTD., Kurashiki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3105 (2006.01); C09G 1/02 (2006.01); H01L 21/762 (2006.01); B24B 37/24 (2012.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31055 (2013.01); B24B 37/24 (2013.01); C09G 1/02 (2013.01); C09K 3/1409 (2013.01); H01L 21/31053 (2013.01); H01L 21/762 (2013.01); H01L 21/76224 (2013.01);
Abstract

The present invention provides a slurry for chemical mechanical polishing, containing abrasive grain (a), compound (b) having an amino group having a pKa of more than 9, and not less than 3 hydroxyl groups, and water.


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