Company Filing History:

8 out of 2,874

Hitachi-high-technologies Corporation

Sumitomo Mitsubishi Silicon Corporation

patents

4. 1 out of 33

Hitachi-science Systems, Ltd.

where one patent can have more than one assignee

Years Active: 2007-2018

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15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10008361 - Charged particle beam device and installation method (2018-06-26),

2. 9287083 - Charged particle beam device (2016-03-15),

3. 9058957 - Charged particle beam apparatus (2015-06-16),

4. 9053902 - Charged-particle radiation apparatus (2015-06-09),

5. 8143573 - Charged particle beam apparatus (2012-03-27),

6. 8097848 - Scanning electron microscope (2012-01-17),

7. 8026491 - Charged particle beam apparatus and method for charged particle beam adjustment (2011-09-27),

8. 7902039 - Method for manufacturing silicon wafer (2011-03-08),

9. 7781313 - Method for manufacturing silicon wafer (2010-08-24),

10. 7755045 - Scanning electron microscope (2010-07-13),

11. 7528049 - Method for manufacturing bonded SOI wafer and bonded SOI wafer manufactured thereby (2009-05-05),

12. 7511271 - Scanning electron microscope (2009-03-31),

13. 7442992 - Bonded SOI substrate, and method for manufacturing the same (2008-10-28),

14. 7378332 - Laminated substrate, method of manufacturing the substrate, and wafer outer periphery pressing jigs used for the method (2008-05-27),

15. 7208058 - SOI substrate and manufacturing method thereof (2007-04-24),

Title: Innovator Shinichi Tomita: Advancing Charged Particle Beam Technology

Introduction: Shinichi Tomita, a notable inventor based in Tokyo, Japan, has made significant contributions to the field of charged particle beam technology. With a remarkable portfolio of 15 patents, Tomita has demonstrated his innovative prowess and technical expertise in developing devices that enhance the performance and applicability of charged particle beams.

Latest Patents: Some of Shinichi Tomita's latest patents include a cutting-edge charged particle beam device and an installation method designed for superior efficiency. One patent describes a compact, high-performance charged particle beam device that is highly portable. The design features a detachable body unit, containing the functional components associated with charged particle beams, and an auxiliary unit that houses a power source. Another patent focuses on a charged particle beam device capable of minimizing field-of-view deviations when observing tilted images or left-right parallax-angle images. This device employs an aligner that compensates for field-of-view issues by adjusting based on specific parameters, ensuring consistent focus even as the primary beam is tilted.

Career Highlights: Throughout his career, Shinichi Tomita has made substantial contributions while working with prominent companies such as Hitachi High-Technologies Corporation and Sumco Corporation. His work has significantly propelled advancements in charged particle technology, influencing various applications in both research and industry.

Collaborations: Tomita has collaborated with esteemed colleagues like Sukehiro Ito and Junichi Katane. These partnerships have helped foster innovation and improve the efficacy of the technologies they developed together.

Conclusion: Shinichi Tomita stands out as a key figure in the realm of charged particle beam innovation. With a wealth of patents and a track record of impactful collaborations, his work continues to influence advancements in technology, paving the way for future developments in this critical field.

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