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Sumitomo Mitsubishi Silicon Corporation

USPTO Granted Patents = 90

% Expired Patents = 8.9

Trademarks = 1

Forward Citations = 2,224

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146 inventors (with patents filed for the assignee):

Masataka Hourai (8 out of 30 patents)

Toshiaki Ono (7 out of 78 patents)

Hiroshi Asano (6 out of 17 patents)

4. Naoshi Adachi (6 out of 11 patents)

5. Shinsuke Sadamitsu (6 out of 11 patents)

6. Takayuki Kubo (6 out of 14 patents)

7. Hideshi Nishikawa (6 out of 8 patents)

8. Nobumitsu Takase (5 out of 10 patents)

9. Eiichi Asayama (5 out of 7 patents)

10. Shigeru Umeno (4 out of 17 patents)

11. Yasuo Koike (4 out of 16 patents)

12. Tadami Tanaka (4 out of 8 patents)

13. Masataka Horai (4 out of 7 patents)

14. Fumio Kawahigashi (4 out of 4 patents)

15. Yoshinobu Nakada (3 out of 26 patents)

Core Competencies:

Epitaxial Growth

Silicon Wafer

Semiconductor Device

High Resistivity Silicon

Single Crystal

SOI Structure

Double Side Polishing

Defect Inspection

Crystal Growth

Manufacturing Method

Heat Treatment

Particle Monitor

90 patents: Sort by Forward Citations

1. 8926754 - Epitaxial growth susceptor (2015-01-06),

2. 8758505 - Silicon wafer and method for manufacturing the same (2014-06-24),

3. 8283252 - Method of manufacturing semiconductor wafer (2012-10-09),

4. 8252404 - High resistivity silicon wafers (2012-08-28),

5. 8002610 - Double side polishing method and apparatus (2011-08-23),

6. 7947572 - Method of manufacturing a SOI structure having a SiGe layer interposed between the silicon and the insulator (2011-05-24),

7. 7837791 - Silicon single crystal wafer for particle monitor (2010-11-23),

8. 7824493 - Silicon wafer and method for manufacturing the same (2010-11-02),

9. 7741193 - SOI structure having a SiGe layer interposed between the silicon and the insulator (2010-06-22),

10. 7740702 - Silicon wafer and method for manufacturing the same (2010-06-22),

11. 7686973 - Silicon wafer etching method and apparatus, and impurity analysis method (2010-03-30),

12. 7678200 - Technique on ozone water for use in cleaning semiconductor substrate (2010-03-16),

13. 7670965 - Production method for silicon wafers and silicon wafer (2010-03-02),

14. 7648409 - Double side polishing method and apparatus (2010-01-19),

15. 7601603 - Method for manufacturing semiconductor device (2009-10-13),

Sumitomo Mitsubishi Silicon Corporation (SMSC) is a global leader in the production of silicon materials for the semiconductor industry. With a rich history in manufacturing high-quality silicon wafers and related products, SMSC has built a strong reputation for delivering reliable and innovative solutions to its customers. As a joint venture between Sumitomo Corporation and Mitsubishi Materials Corporation, SMSC combines the expertise and resources of two renowned Japanese companies to consistently meet the increasing demands of the semiconductor market. With a commitment to excellence, SMSC continues to play a vital role in advancing the technology landscape.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Sep 15 2026

90 Patents

#584 in Tokyo

#1,200 in Japan

#8,505 in the World

Sumitomo Mitsubishi Silicon Corporation

Forward Citations = 2,224

146 inventors:

Masataka Hourai (8 out of 30 patents)

Toshiaki Ono (7 out of 78 patents)

Hiroshi Asano (6 out of 17 patents)

4. Naoshi Adachi (6 out of 11 patents)

5. Shinsuke Sadamitsu (6 out of 11 patents)

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