Saga, Japan

Eiichi Asayama


Average Co-Inventor Count = 4.3

ph-index = 4

Forward Citations = 50(Granted Patents)


Location History:

  • Saga, JP (2002 - 2005)
  • Tokyo, JP (2004 - 2006)

Company Filing History:


Years Active: 2002-2006

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7 patents (USPTO):Explore Patents

Title: Innovations of Eiichi Asayama in Silicon Crystal Growth

Introduction

Eiichi Asayama is a prominent inventor known for his significant contributions to the field of semiconductor technology. He is based in Saga, Japan, and holds a total of seven patents. His work primarily focuses on methods for growing silicon single crystals, which are essential for integrated circuit devices.

Latest Patents

One of Asayama's latest patents is a method for growing silicon single crystals. This method utilizes the Czochralski (CZ) technique at a nitrogen concentration of 1×10 atoms/cm to 1×10 atoms/cm. The cooling rate is maintained at not less than 2.5°C/min, with a crystal temperature ranging from 1150°C to 1000°C. The pulling rate is adjusted to ensure that the oxidation-induced stacking faults generated at the center of the wafer do not exceed one-third of the wafer diameter. This innovative approach effectively suppresses the generation of grown-in defects while keeping production costs low. Additionally, the silicon single crystal produced is suitable for monitoring particles and has a sufficient gettering effect for large-scale integrated devices.

Career Highlights

Throughout his career, Asayama has worked with notable companies such as Sumitomo Mitsubishi Silicon Corporation and Sumitomo Metal Industries, Inc. His expertise in silicon crystal growth has made him a valuable asset in the semiconductor industry.

Collaborations

Asayama has collaborated with esteemed colleagues, including Tadami Tanaka and Toshiaki Ono. Their combined efforts have contributed to advancements in semiconductor technology and the development of high-quality silicon materials.

Conclusion

Eiichi Asayama's innovative methods in silicon single crystal growth have significantly impacted the semiconductor industry. His patents reflect a commitment to enhancing production efficiency and product quality. Asayama's work continues to influence the development of advanced semiconductor devices.

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