Location History:
- Saga, JP (1996 - 2004)
- Tokyo, JP (2004 - 2008)
Company Filing History:
6 out of 90 
1 out of 40 
1 out of 929 Years Active: 1996-2008
Title: Hideshi Nishikawa: Innovator in Silicon Wafer Technology
Introduction
Hideshi Nishikawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of silicon wafer technology, holding a total of eight patents. His work focuses on enhancing the quality and efficiency of silicon wafers used in various electronic devices.
Latest Patents
Nishikawa's latest patents include a high-resistance silicon wafer and its manufacturing method. This innovative wafer is designed to exhibit excellent gettering ability, mechanical strength, and economical efficiency. It effectively prevents the generation of oxygen thermal donors during heat treatment for circuit formation. The manufacturing process involves a heat treatment for forming an oxygen precipitate nucleus at temperatures ranging from 500 to 900°C for five hours or more in a non-oxidizing atmosphere. Additionally, a heat treatment for growing an oxygen precipitate is performed at 950 to 1050°C for ten hours or more on a high-oxygen and carbon-doped high-resistance silicon wafer. This wafer achieves a resistivity of 100 Ωcm or more, with controlled oxygen and carbon concentrations, resulting in a high-resistance, low-oxygen, and high-strength silicon wafer.
Another notable patent involves the production of silicon annealed wafers and silicon epitaxial wafers. These wafers are characterized by a thick layer free from COP defects and a uniform BMD density. The manufacturing process utilizes specific nitrogen concentrations and temperature gradients to ensure minimal defects, thereby enhancing device productivity.
Career Highlights
Throughout his career, Hideshi Nishikawa has worked with leading companies in the semiconductor industry, including Sumitomo Mitsubishi Silicon Corporation and Sumitomo Sitix Corporation. His expertise in silicon wafer technology has positioned him as a key figure in advancing the manufacturing processes of high-quality wafers.
Collaborations
Nishikawa has collaborated with notable professionals in the field, including Masataka Horai and Nobumitsu Takase. These collaborations have contributed to the development of innovative solutions in silicon wafer technology.
Conclusion
Hideshi Nishikawa's contributions to silicon wafer technology have significantly impacted the electronics industry. His innovative patents and career achievements reflect his dedication to advancing semiconductor manufacturing processes.