The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
May. 28, 2012
Kunji Shigeto, Tokyo, JP;
Mitsugu Sato, Tokyo, JP;
Noriko Iizumi, Tokyo, JP;
Hiroyuki Noda, Tokyo, JP;
Masako Nishimura, Tokyo, JP;
Shunya Watanabe, Tokyo, JP;
Mami Konomi, Tokyo, JP;
Shinichi Tomita, Tokyo, JP;
Ryuichiro Tamochi, Tokyo, JP;
Kunji Shigeto, Tokyo, JP;
Mitsugu Sato, Tokyo, JP;
Noriko Iizumi, Tokyo, JP;
Hiroyuki Noda, Tokyo, JP;
Masako Nishimura, Tokyo, JP;
Shunya Watanabe, Tokyo, JP;
Mami Konomi, Tokyo, JP;
Shinichi Tomita, Tokyo, JP;
Ryuichiro Tamochi, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A charged particle beam apparatus is provided with a parameter adjustment practice function for allowing any user to easily learn manual focus adjustment and stigma adjustment. Control conditions of the focus arrangement of an objective lens, an X-stigmator and a Y-stigmator are set according to the user's operation. According to a group of the focus adjustment, an X-stigma adjustment and a Y-stigma adjustment which are set, a practice-purpose image corresponding to the control conditions is read out from a storage device and is displayed on a screen.