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For the Inventor, By the Inventor

Hsinchu, Taiwan

Shih-Chi Lai

USPTO Granted Patents = 16

Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 33(Granted Patents)


Location History:

  • Hsinchu Hsien, TW (2001)
  • Hsin-chu, TW (2000 - 2021)

Company Filing History:

goldMedal15 out of 442 
 
Mosel Vitelic Corporation
 patents
silverMedal1 out of 1 
 
Mosel Vitelec, Inc.
 patent

Years Active: 2000-2021

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16 patents (USPTO):Explore Patents
1. 11139172 - Manufacturing method of gate structure (2021-10-05),
2. 11094792 - Manufacturing method of split gate structure and split gate structure (2021-08-17),
3. 7592240 - Method for forming a gate structure through an amorphous silicon layer and applications thereof (2009-09-22),
4. 7375005 - Method for reclaiming and reusing wafers (2008-05-20),
5. 7282429 - Method of manufacturing Schottky diode device (2007-10-16),
6. 7211523 - Method for forming field oxide (2007-05-01),
7. 7015112 - Method of forming bottom oxide layer in trench structure (2006-03-21),
8. 6974749 - Bottom oxide formation process for preventing formation of voids in trench (2005-12-13),
9. 6828196 - Trench filling process for preventing formation of voids in trench (2004-12-07),
10. 6709952 - Method of forming a bottom oxide layer in a trench (2004-03-23),
11. 6374833 - Method of in situ reactive gas plasma treatment (2002-04-23),
12. 6365455 - Flash memory process using polysilicon spacers (2002-04-02),
13. 6299788 - Silicon etching process (2001-10-09),
14. 6273962 - Method to reduce the particles in load-lock chamber (2001-08-14),
15. 6113736 - Gas ring apparatus for semiconductor etching (2000-09-05),

Title: Innovations of Inventor Shih-Chi Lai

Introduction

Shih-Chi Lai is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 16 patents. His work focuses on improving manufacturing processes and structures, which has a substantial impact on production efficiency and cost reduction.

Latest Patents

One of his latest patents is a manufacturing method of a gate structure. This method includes several steps, such as forming a mask oxide layer on the substrate, performing a photolithography process, etching the trench, and forming a poly layer on the trench. The advantages of this innovation include simplifying the gate structure process and reducing production costs. Another notable patent is the manufacturing method of a split gate structure. This method also involves multiple steps, including forming a mask oxide layer, etching, and forming a shield poly layer on the trench. This innovation improves the characteristics of the split gate structure by increasing the thickness of the inter-poly oxide layer.

Career Highlights

Shih-Chi Lai has worked with notable companies in the semiconductor industry, including Mosel Vitelic Corporation and Mosel Vitelec, Inc. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Throughout his career, Shih-Chi Lai has collaborated with talented individuals, including Tien-min Yuan and Jen-Chieh Chang. These collaborations have contributed to the advancement of his inventions and the overall progress in the field.

Conclusion

Shih-Chi Lai's contributions to semiconductor manufacturing through his innovative patents have significantly impacted the industry. His work continues to influence the development of more efficient manufacturing processes.

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