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For the Inventor, By the Inventor

Tokyo, Japan

Shigeru Hirukawa

This inventor holds 68 USPTO granted patents and 12 published patent applications and 15 EPO patents, primarily in Exposure Technology (CPC class G03F). Top assignees: Nikon Corporation, Nikon Corooration, Nikon Precision Incorporated. Active years: 1990-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeru Hirukawa. Retrieved from https://idiyas.com/inventor/shigeru-hirukawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 68 

% Patents Active = 50.0

 

Average Co-Inventor Count = 2.1

ph-index = 20

Forward Citations = 1,471(Granted Patents)

Forward Citations (Not Self Cited) = 1,407(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Chiba, JP (2000 - 2001)
  • Kashiwa, JP (1990 - 2003)
  • Tokyo, JP (1998 - 2018)
  • Kita-ku, JP (2006 - 2018)

Company Filing History:

goldMedal66 out of 8,995 
 
Nikon Corporation
 patents
silverMedal1 out of 7 
 
Nikon Corooration
 patents
bronzeMedal1 out of 40 
 
Nikon Precision Incorporated
 patents

Years Active: 1990-2018

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Areas of Expertise:
Exposure Apparatus
Exposure Method
Device Manufacturing
Optical Part
Substrate Stage
Illumination Optical
Pattern Formation
Light Amount Distribution
Cleaning Method
Deflecting Member
Polarization Member
Photomask Manufacturing
68 patents (USPTO):Explore Patents
1. 10088760 - Exposure apparatus, exposure method, method for producing device, and optical part (2018-10-02),
2. 10082739 - Exposure method, exposure apparatus, and method for producing device (2018-09-25),
3. 10048602 - Exposure apparatus, exposure method, and method for producing device (2018-08-14),
4. 9885959 - Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator (2018-02-06),
5. 9846371 - Exposure method, substrate stage, exposure apparatus, and device manufacturing method (2017-12-19),
6. 9678437 - Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction (2017-06-13),
7. 9488920 - Exposure method, exposure apparatus, and method for producing device (2016-11-08),
8. 9316921 - Exposure apparatus, exposure method, and method for producing device (2016-04-19),
9. 9268237 - Exposure method, substrate stage, exposure apparatus, and device manufacturing method (2016-02-23),
10. 9182685 - Exposure apparatus, exposure method, method for producing device, and optical part (2015-11-10),
11. 9164393 - Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas (2015-10-20),
12. 9146474 - Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas (2015-09-29),
13. 9019469 - Exposure apparatus, exposure method, method for producing device, and optical part (2015-04-28),
14. 9019467 - Exposure method, substrate stage, exposure apparatus, and device manufacturing method (2015-04-28),
15. 8810767 - Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device (2014-08-19),

Title: Shigeru Hirukawa: A Pioneer in Exposure Technology

Introduction

Shigeru Hirukawa, a talented inventor based in Kita-ku, Japan, has made significant contributions to the field of optical technologies, particularly in exposure apparatuses and methods. With an impressive portfolio of 68 patents, Hirukawa's work has influenced advancements in semiconductor manufacturing and optical systems.

Latest Patents

Hirukawa's latest patents include innovations focused on exposure apparatuses, exposure methods, and methods for producing devices. One notable patent describes an exposure apparatus that exposes a substrate by irradiating exposure light via a projection optical system. This invention includes a substrate table designed to hold the substrate and features a liquid-repellent flat surface, ensuring exceptional exposure accuracy by preventing liquid from remaining on the substrate.

Additionally, his patent for a liquid immersion exposure apparatus outlines a sophisticated projection system that integrates a liquid supply system. This system can supply immersion liquid at varying temperatures through distinct supply ports to form a controlled liquid immersion area, enhancing the exposure process by covering only a portion of the substrate's upper surface.

Career Highlights

Throughout his career, Shigeru Hirukawa has worked with prestigious companies such as Nikon Corporation. His role at Nikon has allowed him to refine his expertise in optical devices and play a crucial part in the development of cutting-edge exposure technologies.

Collaborations

Hirukawa has collaborated with notable professionals in the field, including Soichi Owa and Nobutaka Magome. These partnerships have contributed to the success of various projects and innovations within the optical technology sector.

Conclusion

Shigeru Hirukawa's dedication and innovative spirit have marked him as a key figure in the development of exposure apparatuses and methods. His contributions continue to push the boundaries of technology, furthering advancements in semiconductor manufacturing and optical precision. With numerous patents to his name, Hirukawa remains an influential inventor shaping the future of optical systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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