Kita-ku, Japan

Shigeru Hirukawa

USPTO Granted Patents = 68 

 

Average Co-Inventor Count = 2.1

ph-index = 20

Forward Citations = 1,468(Granted Patents)


Inventors with similar research interests:


Location History:

  • Chiba, JP (2000 - 2001)
  • Kashiwa, JP (1990 - 2003)
  • Tokyo, JP (1998 - 2018)
  • Kita-ku, JP (2006 - 2018)

Company Filing History:


Years Active: 1990-2018

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68 patents (USPTO):

Title: Shigeru Hirukawa: A Pioneer in Exposure Technology

Introduction

Shigeru Hirukawa, a talented inventor based in Kita-ku, Japan, has made significant contributions to the field of optical technologies, particularly in exposure apparatuses and methods. With an impressive portfolio of 68 patents, Hirukawa's work has influenced advancements in semiconductor manufacturing and optical systems.

Latest Patents

Hirukawa's latest patents include innovations focused on exposure apparatuses, exposure methods, and methods for producing devices. One notable patent describes an exposure apparatus that exposes a substrate by irradiating exposure light via a projection optical system. This invention includes a substrate table designed to hold the substrate and features a liquid-repellent flat surface, ensuring exceptional exposure accuracy by preventing liquid from remaining on the substrate.

Additionally, his patent for a liquid immersion exposure apparatus outlines a sophisticated projection system that integrates a liquid supply system. This system can supply immersion liquid at varying temperatures through distinct supply ports to form a controlled liquid immersion area, enhancing the exposure process by covering only a portion of the substrate's upper surface.

Career Highlights

Throughout his career, Shigeru Hirukawa has worked with prestigious companies such as Nikon Corporation. His role at Nikon has allowed him to refine his expertise in optical devices and play a crucial part in the development of cutting-edge exposure technologies.

Collaborations

Hirukawa has collaborated with notable professionals in the field, including Soichi Owa and Nobutaka Magome. These partnerships have contributed to the success of various projects and innovations within the optical technology sector.

Conclusion

Shigeru Hirukawa's dedication and innovative spirit have marked him as a key figure in the development of exposure apparatuses and methods. His contributions continue to push the boundaries of technology, furthering advancements in semiconductor manufacturing and optical precision. With numerous patents to his name, Hirukawa remains an influential inventor shaping the future of optical systems.

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