The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2015

Filed:

Sep. 20, 2007
Applicants:

Takehito Kudo, Kumagaya, JP;

Shigeru Hirukawa, Kita-ku, JP;

Inventors:

Takehito Kudo, Kumagaya, JP;

Shigeru Hirukawa, Kita-ku, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01); G03F 7/20 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G03B 27/42 (2013.01); G03F 7/701 (2013.01); G03F 7/70108 (2013.01); G03F 7/70158 (2013.01); G03F 7/70566 (2013.01);
Abstract

An exposure method and apparatus for illuminating a pattern with an illumination system to expose a substrate through a projection system. The pattern is illuminated with illumination light with a light amount distribution in which an amount of light is larger in a pair of first areas and a pair of second areas than in an area other than the first and second areas on a pupil plane of the illumination system. The pair of the first areas being arranged outside an optical axis, the pair of the second areas being arranged on the same straight line as the pair of the first areas are arranged on, and the pair of the second areas being arranged outside the pair of the first areas.


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