Nikon Corporation

Nikon Precision Incorporated

Nikon Corooration

Shigeru Hirukawa

Soichi Owa

Hiroyuki Nagasaka

Nobutaka Magome

Hiroaki Takaiwa

Kenichi Shiraishi

Masahiro Nei

Yoshihiko Kudo

Naomasa Shiraishi

Naoyuki Kobayashi

Kyoichi Suwa

Jiro Inoue

Takehito Kudo

Yasufumi Nishii

Hirotaka Kohno

Motokatsu Imai

Yasuhiro Omura

Hitoshi Ishizawa

Nobuyuki Irie

Ryuichi Hoshika

Kousuke Suzuki

Tomoyuki Matsuyama

Masaomi Kameyama

Yasuo Shimizu

Eiji Takane

Hiroshi Chiba

Issey Tanaka

Hiroki Tateno

Toshiharu Nakashima

Shinjiro Kondo

Kenji Higashi

Shinichi Nakamura

Yuichi Shibazaki

Yasuaki Tanaka

Kazuo Ushida

Takeshi Kato

Ilya Grodnensky

Norihiko Takatsu

Takeshi Suto

Yoshichika Iwamoto

Etsuya Morita

Hiroaki Hosokawa

Ryoichi Kaneko

An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member () having a liquid repellent flat surface (A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.

Exposure apparatus, exposure method, method for producing device, and optical part

A liquid immersion exposure apparatus includes a projection system having a last element and a liquid supply system by which an immersion liquid is supplied to form a liquid immersion area under the projection system. The liquid supply system has a first supply port and a second supply port. A position of the first supply port is different from a position of the second supply port, and the liquid supply system is capable of supplying the immersion liquid having a first temperature via the first supply port and supplying the immersion liquid having a second temperature different from the first temperature via the second supply port. The liquid immersion area is formed to cover only a portion of an upper surface of the substrate, and the substrate is exposed with an exposure beam through the immersion liquid in the liquid immersion area.

Exposure method, exposure apparatus, and method for producing device

An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.

Exposure apparatus, exposure method, and method for producing device

An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, a deflecting member arranged in the optical path on an incidence side of the optical integrator, which deflects the illumination light, a lens element arranged in the optical path between the deflecting member and the optical integrator, which distributes the illumination light in a region, on a pupil plane of the illumination optical apparatus, away from an optical axis of the illumination optical apparatus, and a polarization member arranged in the optical path between the lens element and the optical integrator, which changes a polarization state of the illumination light so that a polarization direction of the illumination light in the region is substantially coincident with a circumferential direction about the optical axis.

Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator

An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Exposure method, substrate stage, exposure apparatus, and device manufacturing method

An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator, a polarization member arranged in an optical path of the illumination light on an incidence side of the optical integrator, which changes a polarization state of the illumination light, and a distribution changing member arranged in the optical path between the polarization member and the optical integrator, which can change a light amount distribution of the illumination light on a pupil plane of the illumination optical apparatus. The polarization member changes the polarization state of the illumination light so that a polarization direction of the illumination light, which is distributed away from an optical axis of the illumination optical apparatus on the pupil plane, is substantially coincident with a circumferential direction about the optical axis on the pupil plane.

Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction

An exposure apparatus and method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid. A projection optical system projects the image of the pattern onto the substrate. A recovery port recovers the liquid supplied onto the substrate. A temperature sensor measures a temperature of the liquid recovered via the recovery port.

An exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid. The exposure apparatus has a stage which includes a substrate holder for holding the substrate, a detachable member detachably disposed on the stage so that its upper surface contacts an immersion region, and a sensor having a light transmissive member. The detachable member, on which an opening is formed in the upper surface, is disposed on the stage so that the light transmissive member is arranged within the opening.

An exposure method and apparatus for illuminating a pattern with an illumination system to expose a substrate through a projection system. The pattern is illuminated with illumination light with a light amount distribution in which an amount of light is larger in a pair of first areas and a pair of second areas than in an area other than the first and second areas on a pupil plane of the illumination system. The pair of the first areas being arranged outside an optical axis, the pair of the second areas being arranged on the same straight line as the pair of the first areas are arranged on, and the pair of the second areas being arranged outside the pair of the first areas.

Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas

An exposure method and apparatus that illuminates a pattern with an illumination system to expose a substrate through a projection system are provided. The pattern is illuminated with illumination light having a light amount distribution, which is set such that an amount of light is larger in an on-axis area substantially including an optical axis and in a plurality of off-axis areas arranged out of the optical axis than in an area other than the on-axis area and the plurality of off-axis areas on a pupil plane of the illumination system. The polarization states of the illumination light are different between the on-axis area and the off-axis areas.

Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas

A lithography apparatus includes a part having a photocatalytic coating. The lithography apparatus can be an extreme ultraviolet lithography apparatus or an immersion lithography apparatus.

Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device

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Kita-ku, Japan

Shigeru Hirukawa