The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2018
Filed:
Sep. 15, 2016
Nikon Corporation, Tokyo, JP;
Shigeru Hirukawa, Tokyo, JP;
NIKON CORPORATION, Tokyo, JP;
Abstract
A liquid immersion exposure apparatus includes a projection system having a last element and a liquid supply system by which an immersion liquid is supplied to form a liquid immersion area under the projection system. The liquid supply system has a first supply port and a second supply port. A position of the first supply port is different from a position of the second supply port, and the liquid supply system is capable of supplying the immersion liquid having a first temperature via the first supply port and supplying the immersion liquid having a second temperature different from the first temperature via the second supply port. The liquid immersion area is formed to cover only a portion of an upper surface of the substrate, and the substrate is exposed with an exposure beam through the immersion liquid in the liquid immersion area.