The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
May. 05, 2009
Applicants:
Hiroyuki Nagasaka, Kumagaya, JP;
Kenichi Shiraishi, Saitama, JP;
Soichi Owa, Kumagaya, JP;
Shigeru Hirukawa, Kita-ku, JP;
Inventors:
Hiroyuki Nagasaka, Kumagaya, JP;
Kenichi Shiraishi, Saitama, JP;
Soichi Owa, Kumagaya, JP;
Shigeru Hirukawa, Kita-ku, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70958 (2013.01); G03F 7/70341 (2013.01);
Abstract
A lithography apparatus includes a part having a photocatalytic coating. The lithography apparatus can be an extreme ultraviolet lithography apparatus or an immersion lithography apparatus.