The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
May. 05, 2009
Applicants:
Hiroyuki Nagasaka, Kumagaya, JP;
Kenichi Shiraishi, Saitama, JP;
Soichi Owa, Kumagaya, JP;
Shigeru Hirukawa, Kita-ku, JP;
Inventors:
Hiroyuki Nagasaka, Kumagaya, JP;
Kenichi Shiraishi, Saitama, JP;
Soichi Owa, Kumagaya, JP;
Shigeru Hirukawa, Kita-ku, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70958 (2013.01); G03F 7/70341 (2013.01);
Abstract
A lithography apparatus includes a part having a photocatalytic coating. The lithography apparatus can be an extreme ultraviolet lithography apparatus or an immersion lithography apparatus.
Nagasaka, Hiroyuki. (2014). Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device (U.S. Patent No. 8810767). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8810767
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile