The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Dec. 15, 2006
Hiroyuki Nagasaka, Kumagaya, JP;
Hiroaki Takaiwa, Kumagaya, JP;
Shigeru Hirukawa, Kita-ku, JP;
Ryuichi Hoshika, Sagamihara, JP;
Hitoshi Ishizawa, Kawasaki, JP;
Hiroyuki Nagasaka, Kumagaya, JP;
Hiroaki Takaiwa, Kumagaya, JP;
Shigeru Hirukawa, Kita-ku, JP;
Ryuichi Hoshika, Sagamihara, JP;
Hitoshi Ishizawa, Kawasaki, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member () having a liquid repellent flat surface (A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.