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Belmont, CA, United States of America

Nikon Precision Incorporated

USPTO Granted Patents = 40

% Expired Patents = 20.0

Forward Citations = 2,949

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33 inventors (with patents filed for the assignee):

Jacek K Tyminski (8 out of 11 patents)

Raluca Popescu (6 out of 6 patents)

Ilya Grodnensky (6 out of 14 patents)

4. Kyoichi Suwa (6 out of 39 patents)

5. Arun Ananth Aiyer (4 out of 23 patents)

6. Tomoyuki Matsuyama (4 out of 27 patents)

7. Michael R Sogard (4 out of 79 patents)

8. Stephen P Renwick (3 out of 8 patents)

9. Steven Douglas Slonaker (3 out of 7 patents)

10. Martin E Lee (3 out of 46 patents)

11. W Thomas Novak (2 out of 77 patents)

12. Etsuya Morita (2 out of 3 patents)

13. Zahirudeen Premji (2 out of 8 patents)

14. Eric R Johnson (2 out of 4 patents)

15. Steve Slonaker (2 out of 2 patents)

Core Competencies:

Optical Proximity Correction

Critical Dimension Measurement

Lithographic Exposure

Image Reconstruction

Photolithographic Systems

Illuminator Performance

Wafer Alignment

Motion Control Systems

Interferometry

Microlithography

Projection Exposure Apparatus

40 patents: Sort by Forward Citations

1. 10234756 - Scanner based optical proximity correction system and method of use (2019-03-19),

2. 9753363 - Scanner based optical proximity correction system and method of use (2017-09-05),

3. 9529253 - Predicting pattern critical dimensions in a lithographic exposure process (2016-12-27),

4. 9286416 - Scanner based optical proximity correction system and method of use (2016-03-15),

5. 8572518 - Predicting pattern critical dimensions in a lithographic exposure process (2013-10-29),

6. 8438507 - Systems and methods for adjusting a lithographic scanner (2013-05-07),

7. 8365107 - Scanner based optical proximity correction system and method of use (2013-01-29),

8. 8322616 - Automated signature detection system and method of use (2012-12-04),

9. 8300214 - System and method for an adjusting optical proximity effect for an exposure apparatus (2012-10-30),

10. 8027813 - Method and system for reconstructing aberrated image profiles through simulation (2011-09-27),

11. RE41681 - Enhanced illuminator for use in photolithographic systems (2010-09-13),

12. 6974653 - Methods for critical dimension and focus mapping using critical dimension test marks (2005-12-13),

13. 6956659 - Measurement of critical dimensions of etched features (2005-10-18),

14. 6943882 - Method to diagnose imperfections in illuminator of a lithographic tool (2005-09-13),

15. 6842223 - Enhanced illuminator for use in photolithographic systems (2005-01-11),

Company Overview

Nikon Precision Incorporated, based in Belmont, California, specializes in advanced photolithographic systems and technologies essential for semiconductor manufacturing. The company focuses on critical areas such as Optical Proximity Correction, lithographic exposure processes, and critical dimension measurement. With expertise in illuminator diagnostics and position measurement, Nikon Precision plays a pivotal role in enhancing the precision and efficiency of semiconductor fabrication. Their innovations in aerial image analysis and beam delivery apparatus further solidify their position as a leader in the field.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

40 Patents

#3 in Belmont, CA

#2,041 in California

#8,635 in US

#17,087 in the World

Belmont, CA, United States of America

Nikon Precision Incorporated

Forward Citations = 2,949

33 inventors:

Jacek K Tyminski (8 out of 11 patents)

Raluca Popescu (6 out of 6 patents)

Ilya Grodnensky (6 out of 14 patents)

4. Kyoichi Suwa (6 out of 39 patents)

5. Arun Ananth Aiyer (4 out of 23 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Nikon Precision Incorporated. Retrieved from https://idiyas.com/company/nikon-precision

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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