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Belmont, CA, United States of America

Nikon Precision Incorporated

USPTO Granted Patents = 40

Forward Citations = 2,948

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33 inventors (with patents filed for the assignee):

Jacek K Tyminski (8 out of 11 patents)

Raluca Popescu (6 out of 6 patents)

Ilya Grodnensky (6 out of 14 patents)

4. Kyoichi Suwa (6 out of 39 patents)

5. Arun Ananth Aiyer (4 out of 23 patents)

6. Tomoyuki Matsuyama (4 out of 27 patents)

7. Michael R Sogard (4 out of 79 patents)

8. Stephen P Renwick (3 out of 8 patents)

9. Steven Douglas Slonaker (3 out of 7 patents)

10. Martin E Lee (3 out of 46 patents)

11. W Thomas Novak (2 out of 77 patents)

12. Etsuya Morita (2 out of 3 patents)

13. Zahirudeen Premji (2 out of 8 patents)

14. Eric R Johnson (2 out of 4 patents)

15. Steve Slonaker (2 out of 2 patents)

Core Competencies:

Optical Proximity Correction

Lithographic Exposure Process

Critical Dimension Measurement

Photolithographic Systems

Illuminator Diagnostics

Position Measurement

Aerial Image Analysis

Beam Delivery Apparatus

Microlithography Techniques

Stage Mechanisms

Integrated Optical Devices

Reticle Alignment

40 patents: Sort by Forward Citations

1. 10234756 - Scanner based optical proximity correction system and method of use (2019-03-19),

2. 9753363 - Scanner based optical proximity correction system and method of use (2017-09-05),

3. 9529253 - Predicting pattern critical dimensions in a lithographic exposure process (2016-12-27),

4. 9286416 - Scanner based optical proximity correction system and method of use (2016-03-15),

5. 8572518 - Predicting pattern critical dimensions in a lithographic exposure process (2013-10-29),

6. 8438507 - Systems and methods for adjusting a lithographic scanner (2013-05-07),

7. 8365107 - Scanner based optical proximity correction system and method of use (2013-01-29),

8. 8322616 - Automated signature detection system and method of use (2012-12-04),

9. 8300214 - System and method for an adjusting optical proximity effect for an exposure apparatus (2012-10-30),

10. 8027813 - Method and system for reconstructing aberrated image profiles through simulation (2011-09-27),

11. RE41681 - Enhanced illuminator for use in photolithographic systems (2010-09-13),

12. 6974653 - Methods for critical dimension and focus mapping using critical dimension test marks (2005-12-13),

13. 6956659 - Measurement of critical dimensions of etched features (2005-10-18),

14. 6943882 - Method to diagnose imperfections in illuminator of a lithographic tool (2005-09-13),

15. 6842223 - Enhanced illuminator for use in photolithographic systems (2005-01-11),

Nikon Precision Incorporated, a subsidiary of Nikon Corporation, is a leading provider of advanced semiconductor lithography systems. With a long history of innovation and expertise in optics, Nikon Precision has been delivering cutting-edge solutions to the semiconductor industry for over 40 years. Their lithography systems are used in the manufacturing of integrated circuits, enabling the production of smaller, faster, and more powerful electronic devices. Nikon Precision's commitment to continuous improvement and customer satisfaction has made them a trusted partner for semiconductor manufacturers worldwide.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

40 Patents

#3 in Belmont, CA

#1,979 in California

#8,351 in US

#16,570 in the World

Belmont, CA, United States of America

Nikon Precision Incorporated

Forward Citations = 2,948

33 inventors:

Jacek K Tyminski (8 out of 11 patents)

Raluca Popescu (6 out of 6 patents)

Ilya Grodnensky (6 out of 14 patents)

4. Kyoichi Suwa (6 out of 39 patents)

5. Arun Ananth Aiyer (4 out of 23 patents)

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