The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2013

Filed:

Jan. 16, 2008
Applicants:

Jacek Tyminski, Mountain View, CA (US);

Raluca Popescu, San Mateo, CA (US);

Tomoyuki Matsuyama, Saitama, JP;

Inventors:

Jacek Tyminski, Mountain View, CA (US);

Raluca Popescu, San Mateo, CA (US);

Tomoyuki Matsuyama, Saitama, JP;

Assignees:

Nikon Corporation, Tokyo, JP;

Nikon Precision Inc., Belmont, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns for an integrated circuit is compared against the simulated, corrected reticle design. A determination is made as to whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns (δ) is less than a predetermined criteria (ε). The technique further includes completing the model the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria.


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